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公开(公告)号：US12000455B2
公开(公告)日：2024-06-04
申请号：US17691805
申请日：2022-03-10
发明人： Yi Chen Ho , Chih Ping Liao , Chien Ting Lin , Jie-Ying Yang , Wei-Ming Wang , Ker-Hsun Liao , Chi-Hsun Lin
CPC分类号： F16F7/10 , F16F2222/08
摘要： A method that includes measuring vibration levels in a semiconductor manufacturing apparatus, determining one or more sections of the semiconductor manufacturing apparatus that vibrate at levels greater than a predetermined vibration level, and reducing the vibration levels in the one or more sections to be at or within the predetermined vibration level by coupling one or more weights to an external surface of the semiconductor manufacturing apparatus in the one or more sections.
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公开(公告)号：US11037781B2
公开(公告)日：2021-06-15
申请号：US16417007
申请日：2019-05-20
发明人： Szu-Ying Chen , Ya-Wen Chiu , Cheng-Po Chau , Yi Che Chan , Chih Ping Liao , YungHao Wang , Sen-Hong Syue
IPC分类号： H01L21/02 , H01L29/66 , H01L21/68 , H01L21/62 , H01L21/8234 , H01L21/768 , H01L21/762
摘要： Embodiment methods for performing a high pressure anneal process during the formation of a semiconductor device, and embodiment devices therefor, are provided. The high pressure anneal process may be a dry high pressure anneal process in which a pressurized environment of the anneal includes one or more process gases. The high pressure anneal process may be a wet anneal process in which a pressurized environment of the anneal includes steam.
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公开(公告)号：US11986869B2
公开(公告)日：2024-05-21
申请号：US17833814
申请日：2022-06-06
发明人： Yi Chen Ho , Chih Ping Liao , Ker-hsun Liao , Chi-Hsun Lin
CPC分类号： B08B9/0321 , B08B13/00 , B08B2209/032
摘要： A method of cleaning includes placing a semiconductor device manufacturing tool component made of quartz on a support. A cleaning fluid inlet line is attached to a first open-ended tubular quartz projection extending from an outer main surface of the semiconductor device manufacturing tool component. A cleaning fluid is applied to the semiconductor device manufacturing tool component by introducing the cleaning fluid through the cleaning fluid inlet line and the tubular quartz projection.
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