-
公开(公告)号：US20120212716A1
公开(公告)日：2012-08-23
申请号：US13407620
申请日：2012-02-28
CPC分类号： G03F7/70958 , G03F7/70341
摘要： An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
摘要翻译： 光学元件用于曝光装置，其被配置为用曝光光束照射掩模，用于通过投影光学系统将掩模上的图案转印到基板上，并将给定的液体插入在 基板和投影光学系统。 光学元件包括设置在投影光学系统的基板侧的透射光学元件的表面上的第一防溶解部件。
-
公开(公告)号：US20120206705A1
公开(公告)日：2012-08-16
申请号：US13450116
申请日：2012-04-18
IPC分类号： G03B27/54
CPC分类号： G03F7/70341 , G02B1/105 , G02B1/14 , G03F7/70875 , G03F7/70958 , G03F7/70983
摘要： An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.
-
搜索结果
2 条记录 (耗时 0.019 秒)
