公开(公告)号：US10374621B2

公开(公告)日：2019-08-06

申请号：US15366335

申请日：2016-12-01

Applicant: Texas Instruments Incorporated

Inventor： Juan Herbsommer ,  Benjamin Cook ,  S. Josh Jacobs

IPC: H01S1/06 ,  H03B17/00 ,  H03L7/26 ,  H01L23/00 ,  H01L29/06

Abstract: A chip scale vapor cell and millimeter wave atomic clock apparatus are disclosed. The chip scale vapor cell includes a first substrate and a second substrate bonded to the first substrate with a bonding material. A primary hermetic cavity includes a first bottom wall and first sidewalls formed in the first substrate and a first top wall formed by the lower surface of the second substrate. A secondary hermetic cavity includes a second bottom wall and second sidewalls formed in the first substrate and a second top wall formed by the lower surface of the second substrate. The secondary hermetic cavity is separate from the primary hermetic cavity and surrounds the perimeter of the primary hermetic cavity. A gas, which can be a dipolar molecular gas, is sealed in the primary hermetic cavity and the secondary hermetic cavity at a given initial pressure.

公开(公告)号：US20180159547A1

公开(公告)日：2018-06-07

申请号：US15366335

申请日：2016-12-01

Applicant: Texas Instruments Incorporated

Inventor： Juan Herbsommer ,  Benjamin Cook ,  S. Josh Jacobs

IPC: H03L7/26 ,  H01L23/00 ,  H01L29/06

CPC classification number: H03L7/26 ,  H01L24/06 ,  H01L24/46 ,  H01L24/83 ,  H01L29/0649 ,  H01L2224/11 ,  H01L2224/48091 ,  H01L2924/00014

Abstract: A chip scale vapor cell and millimeter wave atomic clock apparatus are disclosed. The chip scale vapor cell includes a first substrate and a second substrate bonded to the first substrate with a bonding material. A primary hermetic cavity includes a first bottom wall and first sidewalls formed in the first substrate and a first top wall formed by the lower surface of the second substrate. A secondary hermetic cavity includes a second bottom wall and second sidewalls formed in the first substrate and a second top wall formed by the lower surface of the second substrate. The secondary hermetic cavity is separate from the primary hermetic cavity and surrounds the perimeter of the primary hermetic cavity. A gas, which can be a dipolar molecular gas, is sealed in the primary hermetic cavity and the secondary hermetic cavity at a given initial pressure.