Vacuum deposition of powdered phosphor
    1.
    发明申请
    Vacuum deposition of powdered phosphor 审中-公开
    粉末荧光粉的真空沉积

    公开(公告)号:US20030161944A1

    公开(公告)日:2003-08-28

    申请号:US10085550

    申请日:2002-02-26

    CPC classification number: C23C14/0629

    Abstract: A vacuum deposition process for depositing powdered phosphor on fiber optic face plates, such as the output fiber optic window of gated image intensifiers. The process involves resistive heating vacuum deposition of a powdered phosphor, such as Zn, CD, (S) to a thickness of 7900 Angstroms, for example, after which it is annealed which promotes a columnar growth and makes the phosphor efficient. The thus annealed phosphor can then be directly overcoated with aluminum of a thinner coating than over a powdered phosphor produced by prior known methods due to the smoother surface produced by this process.

    Abstract translation: 用于在光纤面板上沉积粉末状磷光体的真空沉积工艺,例如门控图像增强器的输出光纤窗口。 该方法包括电阻加热真空沉积诸如Zn,CD,(S)的粉末状荧光体至7900埃的厚度,然后进行退火,其促进柱状生长并使​​荧光体有效。 因此,由于该方法产生的更平滑的表面,所以这样退火的荧光体可以直接用涂层薄的铝覆盖,而不是由现有已知方法产生的粉状荧光粉。

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