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1.发明授权Apparatus and process for delivering an abrasive suspension for the mechanical polishing of a substrate 有权用于输送用于基材的机械抛光的研磨悬浮液的装置和方法
公开(公告)号：US6125876A
公开(公告)日：2000-10-03
申请号：US223497
申请日：1998-12-29
CPC分类号： B24B57/02 , B24B37/04 , Y10T137/4673 , Y10T137/469 , Y10T137/4807
摘要： An apparatus for delivering abrasive suspensions includes a reservoir containing an abrasive suspension, a loop for delivering the abrasive suspension to a point of use, the loop being connected to the reservoir, a pumping arrangement for circulating the abrasive suspension in the loop and for ensuring its return into the reservoir, the loop and the reservoir being arranged for recovering the abrasive suspension after circulation in the loop at a recovery point of the reservoir, and a control system for controlling the pumping arrangement so as to maintain a continuous circulation of the suspension.
摘要翻译： 用于递送磨料悬浮液的装置包括含有研磨悬浮液的储存器，用于将研磨悬浮液输送到使用点的回路，所述回路连接到储存器，泵送装置，用于使研磨悬浮液在循环中循环并确保其 返回到储存器中，循环和储存器被布置用于在储存器的回收点处循环回收磨料悬浮液，以及用于控制泵送装置以控制悬浮液的连续循环的控制系统。
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2.发明授权
公开(公告)号：US6146008A
公开(公告)日：2000-11-14
申请号：US57606
申请日：1998-04-09
IPC分类号： B01F3/08 , B01F15/04 , B01J19/00 , G05D11/02 , G05D11/13 , G05D21/00 , G05D21/02 , H01L21/304 , B01F15/02
CPC分类号： G05D21/02 , B01J19/0006 , G05D11/138 , B01J2219/00186 , Y10T137/0329
摘要： System for diluting an ultrapure concentrated chemical including: (i) a first tank which contains the chemical in concentrated form having a predetermined purity P, (ii) a supply of ultrapure water of purity at least equal to P, (iii) a second tank for mixing the concentrated chemical with the ultrapure water to obtain a solution of diluted chemical whose purity is at least equal to P, (iv) a structure for adjusting the titre of the solution of diluted, chemical to a desired final concentration. The structure for adjusting the titre includes (a) a structure for measuring the titre of the dilute solution after mixing a predetermined quantity of ultrapure water with concentrated chemical of purity P so as to obtain a mixture with a concentration of chemical which is greater than the desired final concentration of the diluted chemical, (b) a structure for adding an additional quantity of ultrapure water to the mixture to obtain a second further diluted mixture, this additional quantity being at most equal to a theoretical quantity necessary for obtaining the desired titre, and (c) a structure for stirring the second further diluted mixture for a time such that the diluted chemical is recirculated on itself at least approximately three times so as to ensure that the diluted chemical is well homogenized and that the titre is substantially constant over the entire volume of the diluted chemical, and (d) a structure for checking the titre of the solution of diluted chemical; and (v) a third tank for storing the chemical.
摘要翻译： 用于稀释超纯浓缩化学品的系统，包括：（i）含有浓缩形式的具有预定纯度P的化学品的第一罐，（ii）提供至少等于P的纯度的超纯水，（iii）第二罐 用于将浓缩化学品与超纯水混合以获得纯度至少等于P的稀释化学品溶液，（iv）用于将稀释的化学溶液的滴定度调节至所需最终浓度的结构。 用于调整滴定度的结构包括（a）在将预定量的超纯水与浓缩的纯度为P的浓缩化学品混合后，测量稀释溶液的滴定度的结构，以获得化学浓度大于 稀释化学品的所需最终浓度，（b）用于向混合物中加入额外量的超纯水以获得第二另外稀释的混合物的结构，该附加量最多等于获得所需滴定度所需的理论量， 和（c）用于将第二进一步稀释的混合物搅拌一段时间的结构，使得稀释的化学品在其自身上再循环至少约三次，以确保稀释的化学品均匀，并且滴定度基本上恒定 稀释化学品的全部体积，（d）用于检查稀释化学品溶液滴定度的结构; 和（v）用于储存化学品的第三罐。
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3.发明授权Process and apparatus for producing high-purity chemicals for the microelectronics industry 失效用于生产微电子工业高纯度化学品的工艺和设备公开(公告)号：US06183720B2
公开(公告)日：2001-02-06
申请号：US09056765
申请日：1998-04-08
申请人： Thierry Laederich , Hervé Dulphy
发明人： Thierry Laederich , Hervé Dulphy
IPC分类号： C01B707
CPC分类号： C01B7/195 , C01B7/0731 , C01C1/022 , C01P2006/80
摘要： A process for producing a high-purity liquid chemical is provided. A chemical gas is successively purified over first and second purification columns by passing, countercurrently, a scrubbing solution of initially deionized high-purity water through the first and second purification columns, or by passing, countercurrently, a first scrubbing solution of initially deionized high-purity water through the first column and a second scrubbing solution of initially deionized water through the second column. Each of the scrubbing solutions gradually becomes a spent scrubbing solution loaded with impurity. A high-purity chemical gas leaves the second purification column with a low content of metallic elements. The high-purity chemical gas is subsequently dissolved in a liquid in a dissolution column including a top and a bottom. The liquid at the bottom of the dissolution column is collected and continuously recirculated, and is enriched with purified chemical gas, thereby forming a high-purity liquid chemical. The high-purity liquid chemical is subsequently distributed when a desired concentration of dissolved gas has been reached.
摘要翻译： 提供了一种生产高纯度液体化学品的方法。 通过使第一和第二纯化塔逆流通过初始去离子高纯水的洗涤溶液，或通过逆流通过第一和第二纯化塔的初始去离子水的第一洗涤溶液， 通过第一塔的纯净水和初始去离子水通过第二塔的第二洗涤溶液。 每个洗涤溶液逐渐变成装有杂质的废擦洗溶液。 高纯度化学气体离开具有低含量金属元素的第二纯化塔。 随后将高纯度化学气体溶解在包括顶部和底部的溶解柱中的液体中。 将溶解塔底部的液体收集并连续循环，并用纯化学气体富集，从而形成高纯度液体化学品。 随后，当达到所需浓度的溶解气体时，高纯度液体化学品随后分布。
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公开(公告)号：US08308146B2
公开(公告)日：2012-11-13
申请号：US13173027
申请日：2011-06-30
申请人： Hervé Dulphy , Pascal Moine , Thierry Laederich
发明人： Hervé Dulphy , Pascal Moine , Thierry Laederich
IPC分类号： B01F3/04
CPC分类号： B01D53/78 , B01D53/18 , B01D2258/0216
摘要： An apparatus and method for the treatment of gaseous effluents involving contact with a liquid may include a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, wherein the chamber allows a gas to be treated. The chamber may also release residual gases following treatment involving contact with the liquid. The apparatus may also include a turbine that includes one or more stages which ensure improved contact between the gas and the liquid, the upper part of the turbine being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, a sensor for measuring the pH of the liquid.
摘要翻译： 用于处理涉及与液体接触的气体流出物的装置和方法可以包括气体/液体接触室，其可以在其下部接收液体，并且顶盖有气体盖，其中所述室允许气体为 治疗。 室内还可以在涉及与液体接触的处理之后释放残余气体。 该装置还可以包括涡轮机，其包括一个或多个台阶，其确保气体和液体之间的改善的接触，涡轮的上部配备有用于将位于液体上方的气体盖中的气体拉出的开口; 并且优选地，用于测量液体的pH的传感器。
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公开(公告)号：US20110259196A1
公开(公告)日：2011-10-27
申请号：US13173027
申请日：2011-06-30
申请人： Hervé Dulphy , Pascal Moine , Thierry Laederich
发明人： Hervé Dulphy , Pascal Moine , Thierry Laederich
CPC分类号： B01D53/78 , B01D53/18 , B01D2258/0216
摘要： The invention relates to an apparatus for the treatment of gaseous effluents, such as those originating from the production of semi-conductors involving contact with a liquid. The inventive apparatus consists of: a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, said chamber comprising means for introducing a gas to be treated and means for releasing residual gases following treatment involving contact with the liquid; turbine-type gas/liquid contacting means comprising one or more stages which ensure improved contact between the gas and the liquid, the upper part of said means being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, means for measuring the pH of the liquid.
摘要翻译： 本发明涉及一种用于处理气体流出物的装置，例如源于生产涉及与液体接触的半导体的那些。 本发明的装置包括：气/液接触室，其可以在其下部接收液体并且被顶盖有气体盖，所述室包括用于引入待处理气体的装置和用于在处理后释放残留气体的装置 涉及液体接触; 涡轮式气体/液体接触装置包括一个或多个级，其确保气体和液体之间的接触改善，所述装置的上部装备有用于将位于液体上方的气体盖中的气体拉出的开口; 并且优选地，用于测量液体的pH的装置。
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公开(公告)号：US08016271B2
公开(公告)日：2011-09-13
申请号：US10592336
申请日：2005-03-31
申请人： Hervé Dulphy , Pascal Moine , Thierry Laederich
发明人： Hervé Dulphy , Pascal Moine , Thierry Laederich
IPC分类号： B01F3/04
CPC分类号： B01D53/78 , B01D53/18 , B01D2258/0216
摘要： The invention relates to an apparatus for the treatment of gaseous effluents, such as those originating from the production of semi-conductors involving contact with a liquid. The inventive apparatus consists of: a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, said chamber comprising means for introducing a gas to be treated and means for releasing residual gases following treatment involving contact with the liquid; turbine-type gas/liquid contacting means comprising one or more stages which ensure improved contact between the gas and the liquid, the upper part of said means being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, means for measuring the pH of the liquid.
摘要翻译： 本发明涉及一种用于处理气体流出物的装置，例如源于生产涉及与液体接触的半导体的那些。 本发明的装置包括：气/液接触室，其可以在其下部接收液体并且被顶盖有气体盖，所述室包括用于引入待处理气体的装置和用于在处理后释放残余气体的装置 涉及液体接触; 涡轮式气体/液体接触装置包括一个或多个级，其确保气体和液体之间的接触改善，所述装置的上部装备有用于将位于液体上方的气体盖中的气体拉出的开口; 并且优选地，用于测量液体的pH的装置。
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公开(公告)号：US20070205522A1
公开(公告)日：2007-09-06
申请号：US10592336
申请日：2005-03-31
申请人： Hervé Dulphy , Pascal Moine , Thierry Laederich
发明人： Hervé Dulphy , Pascal Moine , Thierry Laederich
IPC分类号： B01D47/02
CPC分类号： B01D53/78 , B01D53/18 , B01D2258/0216
摘要： The invention relates to an apparatus for the treatment of gaseous effluents, such as those originating from the production of semi-conductors involving contact with a liquid. The inventive apparatus consists of: a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, said chamber comprising means for introducing a gas to be treated and means for releasing residual gases following treatment involving contact with the liquid; turbine-type gas/liquid contacting means comprising one or more stages which ensure improved contact between the gas and the liquid, the upper part of said means being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, means for measuring the pH of the liquid.
摘要翻译： 本发明涉及一种用于处理气体流出物的装置，例如源于生产涉及与液体接触的半导体的那些。 本发明的装置包括：气/液接触室，其可以在其下部接收液体并且被顶盖有气体盖，所述室包括用于引入待处理气体的装置和用于在处理后释放残余气体的装置 涉及液体接触; 涡轮式气体/液体接触装置包括一个或多个级，其确保气体和液体之间的接触改善，所述装置的上部装备有用于将位于液体上方的气体盖中的气体拉出的开口; 并且优选地，用于测量液体的pH的装置。
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