公开(公告)号：US09400953B1

公开(公告)日：2016-07-26

申请号：US14285469

申请日：2014-05-22

Applicant: Thin Film Electronics ASA

Inventor： Criswell Choi ,  Joerg Rockenberger ,  Christopher Gudeman ,  J. Devin Mackenzie ,  Partick Smith ,  James Montague Cleeves

IPC: G03F7/00 ,  G01S13/74 ,  G06K19/077 ,  G08B13/24

CPC classification number: G06K19/07773 ,  G03F7/0043 ,  G03F7/2055 ,  G06K19/07749 ,  G08B13/2402 ,  G08B13/2417 ,  G08B13/244 ,  G08B13/2468

Abstract: Methods, algorithms, processes, circuits, and/or structures for laser patterning suitable for customized RFID designs are disclosed. In one embodiment, a method of laser patterning of an identification device can include the steps of: (i) depositing a patternable resist formulation on a substrate having configurable elements and/or materials thereon; (ii) irradiating the resist formulation with a laser tool sufficiently to change the solubility characteristics of the resist in a developer; and (iii) developing exposed areas of the resist using the developer. Embodiments of the present invention can advantageously provide a relatively low cost and high throughput approach for customized RFID devices.

Abstract translation: 公开了适用于定制RFID设计的用于激光图案的方法，算法，过程，电路和/或结构。 在一个实施例中，识别装置的激光图案化的方法可以包括以下步骤：（i）在其上具有可配置元件和/或材料的衬底上沉积可图案化的抗蚀剂制剂; （ii）用激光工具照射抗蚀剂制剂，足以改变显影剂中抗蚀剂的溶解度特性; 和（iii）使用显影剂显影抗蚀剂的曝光区域。 本发明的实施例可以有利地为定制的RFID设备提供相对低成本和高吞吐量的方法。