公开(公告)号：US06821794B2

公开(公告)日：2004-11-23

申请号：US10264590

申请日：2002-10-04

申请人： Thomas Laursen ,  Mamoru Yamayoshi

发明人： Thomas Laursen ,  Mamoru Yamayoshi

IPC分类号： H01L2100

CPC分类号： B24B37/013 ,  H01L21/31053 ,  H01L21/3212 ,  H01L22/26

摘要： A system and method for determining endpoint detection in semiconductor wafer planarization is provided. The system and method provide a flexible solution that can compensate for baseline variability induced errors that may otherwise occur in endpoint detection. The system uses an endpoint detection signal that monitors the optical characteristics of the wafer being planarized. The system and method continue to monitor the detection signal during planarization until it meets endpoint criterion that indicates endpoint completion. When the endpoint criterion is reached, a new snapshot is taken from a previous time period and a new baseline is calculated. The endpoint detection signal is then recalculated based upon the new baseline and the recalculated detection signal is again compared to the endpoint criterion. If the recalculated endpoint detection signal again substantially meets the endpoint criterion then the detection of endpoint is confirmed. If the recalculated detection signal no longer meets the endpoint criterion, the planarization process continues with the new baseline used as the basis for endpoint detection.

摘要翻译： 提供了一种用于确定半导体晶片平面化中的端点检测的系统和方法。 该系统和方法提供了一种灵活的解决方案，可以补偿在端点检测中可能发生的基线变异性诱发的错误。 该系统使用端点检测信号来监视被平坦化的晶片的光学特性。 系统和方法在平坦化期间继续监测检测信号，直到满足指示端点完成的端点标准。 当达到端点标准时，从先前的时间段获取新的快照，并计算新的基线。 然后基于新的基线重新计算端点检测信号，并且重新计算的检测信号再次与端点标准进行比较。 如果重新计算的端点检测信号再次基本上满足端点标准，则确认端点的检测。 如果重新计算的检测信号不再满足端点标准，则平坦化过程将继续以新的基线作为端点检测的基础。