公开(公告)号：US20220076930A1

公开(公告)日：2022-03-10

申请号：US17468935

申请日：2021-09-08

Applicant: Tokyo Electron Limited

Inventor： Toshiaki Saijo ,  Jun Abe ,  Shogo Shoji ,  Junya Kato

IPC: H01J37/32

Abstract: In a plasma processing apparatus, a controller specifies a time point when a current starts to flow between an edge ring and a DC power supply after beginning an application of a negative DC voltage to the edge ring from the DC power supply. The controller specifies, from a voltage measurement value indicating a voltage of the edge ring at the time point, an estimate of a self-bias voltage of the edge ring generated by a supply of a radio frequency power. The controller sets a sum of an absolute value of the estimate of the self-bias voltage and a set value as an absolute value of the negative DC voltage to be applied to the edge ring by the DC power supply.

公开(公告)号：US12205801B2

公开(公告)日：2025-01-21

申请号：US17468935

申请日：2021-09-08

Applicant: Tokyo Electron Limited

Inventor： Toshiaki Saijo ,  Jun Abe ,  Shogo Shoji ,  Junya Kato

IPC: H01J37/32

Abstract: In a plasma processing apparatus, a controller specifies a time point when a current starts to flow between an edge ring and a DC power supply after beginning an application of a negative DC voltage to the edge ring from the DC power supply. The controller specifies, from a voltage measurement value indicating a voltage of the edge ring at the time point, an estimate of a self-bias voltage of the edge ring generated by a supply of a radio frequency power. The controller sets a sum of an absolute value of the estimate of the self-bias voltage and a set value as an absolute value of the negative DC voltage to be applied to the edge ring by the DC power supply.