公开(公告)号：US20200135436A1

公开(公告)日：2020-04-30

申请号：US16557669

申请日：2019-08-30

Applicant: Tokyo Electron Limited

Inventor： Mitsuhiro IWANO ,  Masanori HOSOYA

IPC: H01J37/32

Abstract: In a cleaning method according to an exemplary embodiment, a plasma is formed from a cleaning gas in a chamber of a plasma processing apparatus. A focus ring is mounted on a substrate support in the chamber to extend around a central axis of the chamber. While the plasma is formed, a magnetic field distribution is formed in the chamber by an electromagnet. The magnetic field distribution has a maximum horizontal component in a location on the focus ring or a location outside the focus ring in a radial direction with respect to the central axis.