公开(公告)号：US11225708B2

公开(公告)日：2022-01-18

申请号：US16467281

申请日：2017-12-07

Applicant: Tokyo Electron Limited

Inventor： Yoshiyuki Kobayashi ,  Naoki Yoshii ,  Katsuji Kadosawa ,  Kimitomo Kaji

IPC: H01M4/04 ,  C23C4/134 ,  C23C4/08 ,  H01G11/86 ,  H01M4/1395 ,  H05H1/34 ,  H05H1/42

Abstract: There is provision of a plasma spraying device including a supplying section configured to convey feedstock powder with a plasma generating gas, and to inject the feedstock powder and the plasma generating gas from an opening of a tip; a plasma generating section configured to generate a plasma by decomposing the injected plasma generating gas using electric power of 500 W to 10 kW; and a chamber causing the supplying section and the plasma generating section to be an enclosed region, which is configured to deposit the feedstock powder on a workpiece by melting the feedstock powder by the plasma generated in the enclosed region. The feedstock powder is any one of lithium (Li), aluminum (Al), copper (Cu), silver (Ag), and gold (Au). A particle diameter of the feedstock powder is between 1 μm and 50 μm.