公开(公告)号：US20210395893A1

公开(公告)日：2021-12-23

申请号：US17304119

申请日：2021-06-15

Applicant: Tokyo Electron Limited

Inventor： Kuniyasu SAKASHITA ,  Satoru OGAWA

IPC: C23C16/455 ,  C23C16/34 ,  C23C16/40 ,  H01L21/02

Abstract: A gas nozzle extending vertically inward of an inner wall of a processing container having a substantially cylindrical shape, includes a plurality of first gas holes provided at intervals in a longitudinal direction; and a second gas hole provided at a tip of the gas nozzle and oriented toward a side opposite to a side in which the plurality of first gas holes are provided in a plan view from the longitudinal direction, wherein the second gas hole has an opening area larger than an opening area of each of the first gas holes.