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公开(公告)号：US20180350567A1
公开(公告)日：2018-12-06
申请号：US15989324
申请日：2018-05-25
Applicant: Tokyo Electron Limited
Inventor： Yuki SUGAWARA , Masanori ASAHARA , Masafumi URAKAWA
IPC: H01J37/32
Abstract: There is provision of a member used in a plasma processing apparatus configured to generate plasma from a gas in a processing vessel and to process a substrate disposed on a mounting base in the processing vessel using the plasma. The member includes a surface exposed to the plasma in the processing vessel in a state installed in the processing vessel, and a coating layer including cobalt which covers a part of the surface.
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