公开(公告)号：US20130057836A1

公开(公告)日：2013-03-07

申请号：US13598924

申请日：2012-08-30

申请人： Tomohiro NAKASHIMA ,  Shin INOUE ,  Yoshitaka HARA ,  Izumi HASEGAWA ,  Kunie OGATA ,  Takuya MORI

发明人： Tomohiro NAKASHIMA ,  Shin INOUE ,  Yoshitaka HARA ,  Izumi HASEGAWA ,  Kunie OGATA ,  Takuya MORI

IPC分类号： G03B27/52

CPC分类号： H01L21/67288

摘要： The present invention is a substrate treatment apparatus for performing solution treatment on a substrate, performing post-treatment in a treatment module subsequent to the solution treatment, including: a solution treatment section including a plurality of nozzles prepared for respective kinds of treatment solutions corresponding to lots of substrates; a transfer mechanism for transferring the substrate; a monitoring section monitoring whether there is a failure in discharge of the treatment solution in the nozzle; and a control unit outputting a control signal to prohibit the solution treatment in the solution treatment section for a substrate scheduled to be treated using a nozzle determined to have a failure by the monitoring section and to perform the solution treatment in the solution treatment section for a substrate scheduled to be treated using a nozzle other than the nozzle determined to have a failure.

摘要翻译： 本发明是一种在基板上进行固溶处理的基板处理装置，在固溶处理后的处理模块中进行后处理，其特征在于，包括：固溶处理部，其具有为各种对应于 大量的底物; 用于转移衬底的转移机构; 监视部，监视喷嘴中处理液的排出是否失败; 以及控制单元，其输出控制信号，以禁止在待处理的基板的固溶处理部中进行固溶处理，所述基板通过由所述监视部确定为具有故障的喷嘴进行处理，并且在所述固溶处理部中执行所述固溶处理 预定使用被确定为失效的喷嘴以外的喷嘴进行处理的基板。