公开(公告)号：US20070131267A1

公开(公告)日：2007-06-14

申请号：US11336354

申请日：2006-01-20

Applicant: Toomas Kriisa

Inventor： Toomas Kriisa

IPC: H01L37/00

CPC classification number: H01L35/02 ,  H01J45/00 ,  H01L35/00 ,  H01L35/34 ,  H02N3/00

Abstract: A current source and method of producing the current source are provided. The current source includes a metal source, a buffer layer, a filter and a collector. An electrical connection is provided to the metal layer and semiconductor layer and a magnetic field applier may be also provided. The source metal has localized states at a bottom of the conduction band and probability amplification. The interaction of the various layers produces a spontaneous current. The movement of charge across the current source produces a voltage, which rises until a balancing reverse current appears. If a load is connected to the current source, current flows through the load and power is dissipated. The energy for this comes from the thermal energy in the current source, and the device gets cooler.

Abstract translation: 提供了一种电流源和产生电流源的方法。 电流源包括金属源，缓冲层，过滤器和集电器。 向金属层和半导体层提供电连接，并且还可以提供磁场施加器。 源极金属具有导带底部的局部化状态和概率放大。 各层的相互作用产生自发电流。 跨过电流源的电荷的运动产生电压，其升高直到出现平衡反向电流。 如果负载连接到电流源，则电流流过负载并且功率消耗。 这些能源来自电流源的热能，器件变冷。

公开(公告)号：US08581469B2

公开(公告)日：2013-11-12

申请号：US13242639

申请日：2011-09-23

Applicant: Toomas Kriisa

Inventor： Toomas Kriisa

IPC: H02N10/00 ,  H01J45/00 ,  H02N3/00

CPC classification number: H01L35/02 ,  H01J45/00 ,  H01L35/00 ,  H01L35/34 ,  H02N3/00

Abstract: A current source and method of producing the current source are provided. The current source includes a metal source, a buffer layer, a filter and a collector. An electrical connection is provided to the metal layer and semiconductor layer and a magnetic field applier may be also provided. The source metal has localized states at a bottom of the conduction band and probability amplification. The interaction of the various layers produces a spontaneous current. The movement of charge across the current source produces a voltage, which rises until a balancing reverse current appears. If a load is connected to the current source, current flows through the load and power is dissipated. The energy for this comes from the thermal energy in the current source, and the device gets cooler.

Abstract translation: 提供了一种电流源和产生电流源的方法。 电流源包括金属源，缓冲层，过滤器和集电器。 向金属层和半导体层提供电连接，并且还可以提供磁场施加器。 源极金属具有导带底部的局部化状态和概率放大。 各层的相互作用产生自发电流。 跨过电流源的电荷的运动产生电压，其升高直到出现平衡反向电流。 如果负载连接到电流源，则电流流过负载并且功率消耗。 这些能源来自电流源的热能，器件变冷。

公开(公告)号：US08053947B2

公开(公告)日：2011-11-08

申请号：US11336354

申请日：2006-01-20

Applicant: Toomas Kriisa

Inventor： Toomas Kriisa

IPC: H02N11/00

CPC classification number: H01L35/02 ,  H01J45/00 ,  H01L35/00 ,  H01L35/34 ,  H02N3/00

Abstract: A current source and method of producing the current source are provided. The current source includes a metal source, a buffer layer, a filter and a collector. An electrical connection is provided to the metal layer and semiconductor layer and a magnetic field applier may be also provided. The source metal has localized states at a bottom of the conduction band and probability amplification. The interaction of the various layers produces a spontaneous current. The movement of charge across the current source produces a voltage, which rises until a balancing reverse current appears. If a load is connected to the current source, current flows through the load and power is dissipated. The energy for this comes from the thermal energy in the current source, and the device gets cooler.

Abstract translation: 提供了一种电流源和产生电流源的方法。 电流源包括金属源，缓冲层，过滤器和集电器。 向金属层和半导体层提供电连接，并且还可以提供磁场施加器。 源极金属具有导带底部的局部化状态和概率放大。 各层的相互作用产生自发电流。 跨过电流源的电荷的运动产生电压，其升高直到出现平衡反向电流。 如果负载连接到电流源，则电流流过负载并且功率消耗。 这些能源来自电流源的热能，器件变冷。