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公开(公告)号：US10655214B2
公开(公告)日：2020-05-19
申请号：US15560733
申请日：2016-04-01
申请人： Tosoh SMD, Inc.
发明人： Eugene Y. Ivanov , Matthew Fisher , Alex Kuhn
摘要： Methods for making Ta sputter targets and sputter targets made thereby. Ta ingots are compressed along at least two of the x, y, and z dimensions and then cross rolled in at least one of those dimensions. A pair of target blanks is then cut from the cross rolled ingot. The resulting targets have a predominate mix of {100} and {111} textures and have reduced B {100} and B {111} banding factors.
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公开(公告)号：US20180080120A1
公开(公告)日：2018-03-22
申请号：US15560733
申请日：2016-04-01
申请人： Tosoh SMD, Inc.
发明人： Eugene Y. Ivanov , Matthew Fisher , Alex Kuhn
CPC分类号： C23C14/3414 , B21B1/024 , B21B1/026 , B21B15/0007 , B21B2015/0014 , B21B2015/0021 , C22C27/02 , C22F1/18 , H01J37/3426
摘要： Methods for making Ta sputter targets and sputter targets made thereby. Ta ingots are compressed along at least two of the x, y, and z dimensions and then cross rolled in at least one of those dimensions. A pair of target blanks is then cut from the cross rolled ingot. The resulting targets have a predominate mix of {100} and {111} textures and have reduced B {100} and B {111} banding factors.
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公开(公告)号：US20200240006A1
公开(公告)日：2020-07-30
申请号：US16849050
申请日：2020-04-15
申请人： Tosoh SMD, Inc.
发明人： Eugene Y. Ivanov , Matthew Fisher , Alex Kuhn
摘要： Methods for making Ta sputter targets and sputter targets made thereby. Ta ingots are compressed along at least two of the x, y, and z dimensions and then cross rolled in at least one of those dimensions. A pair of target blanks is then cut from the cross rolled ingot. The resulting targets have a predominate mix of {100} and {111} textures and have reduced B {100} and B {100} banding factors.
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