Vacuum suction membrane for holding silicon wafer
    1.
    发明授权
    Vacuum suction membrane for holding silicon wafer 失效
    用于保持硅晶片的真空吸膜

    公开(公告)号:US07070490B2

    公开(公告)日:2006-07-04

    申请号:US10109015

    申请日:2002-03-28

    IPC分类号: B24B5/00

    摘要: A membrane for vacuum suction of a silicon water typically used inside a polishing head. The membrane has a flat main body and a plurality of protrusions each having a spiny shape over the surface of the flat main body. The protrusions are formed in positions that correspond to the holes of a supporting multiple-hole panel. The protrusions on the flat main body lower the suction pressure between the wafer and the membrane somewhat so that wafer unloading failure is minimized.

    摘要翻译: 通常用于抛光头内部的硅水的真空抽吸膜。 膜具有扁平主体和多个突起,每个突起在平坦主体的表面上具有多晶形状。 突起形成在与支撑多孔板的孔相对应的位置。 扁平主体上的突起稍微降低了晶片和膜之间的吸入压力,使得晶片卸载故障最小化。