Lithographic fragmentation technology

    公开(公告)号:US10416564B1

    公开(公告)日:2019-09-17

    申请号:US15919501

    申请日:2018-03-13

    IPC分类号: G03F7/30 F42B33/00 F42B12/24

    摘要: A fragmentation pattern is formed on a surface of a warhead using an etchant process. An etchant resistance material is coated on an interior surface of the warhead casing. A portion of the etchant resistant material is selectively removed by a directed energy process and an etchant is applied to the exposed portion of the warhead casing surface thereby etching the fragmentation pattern. Alternatively, a protective coating is applied over the entire surface thereby creating the fragmentation pattern.