公开(公告)号：US20170299964A1

公开(公告)日：2017-10-19

申请号：US15281250

申请日：2016-09-30

Applicant: U.S. Government as Represented by the Secretary of the Army

Inventor： Paul C. Manz ,  Philip J. Magnotti ,  Ductri H. Nguyen

IPC: G03F7/30 ,  F42B33/00 ,  F42B12/24

CPC classification number: G03F7/30 ,  F42B12/24 ,  F42B12/32 ,  F42B33/00

Abstract: A fragmentation pattern is formed on a surface of a warhead using a lithographic process. A photoresistant material is coated on an interior surface of the warhead casing. A portion of the photoresistant material is selectively cured by projecting an image of the fragmentation pattern onto the photoresistant material. The uncured portion of the photoresistant material is removed and an etchant is applied to the exposed portion of the warhead casing surface thereby etching the fragmentation pattern. Alternatively, a protective coating is applied over the entire surface thereby creating the fragmentation pattern.