公开(公告)号：US20240120233A1

公开(公告)日：2024-04-11

申请号：US18263548

申请日：2022-09-26

Applicant: ULVAC, INC.

Inventor： Tetsushi Fujinaga ,  Yukinobu Numata ,  Yasuo Ookubo ,  Daiki Shimada

IPC: H01L21/687 ,  C23C14/50 ,  H01L21/683

CPC classification number: H01L21/68742 ,  C23C14/505 ,  H01L21/6831

Abstract: A vacuum processing apparatus of this invention having a stage on which is disposed the to-be-processed substrate further has a lifting/rotation mechanism capable of lifting the to-be-processed substrate lying on the stage off from an upper surface of the stage to a predetermined height position so that, at this lifted position, the to-be-processed substrate is capable of rotation about a substrate center by a predetermined rotational angle. The lifting/rotation mechanism has: a driving rod built into the stage so as to be moveable up and down and also be rotatable; and a substrate supporting body having a base end plate part capable of contacting a central region, including the substrate center, of the to-be-processed substrate. The substrate supporting body further has at least two arm plate parts elongated from the base end plate part outward thereof.