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    Film-forming apparatus and film-forming method
    2.
    发明授权
    Film-forming apparatus and film-forming method 有权

    公开(公告)号：US11111577B2

    公开(公告)日：2021-09-07

    申请号：US15757820

    申请日：2017-02-27

    Applicant: ULVAC, Inc.

    Inventor： Yousuke Kobayashi ,  Harunori Iwai ,  Tetsushi Fujinaga ,  Atsuhito Ihori ,  Noriaki Tani

    IPC: C23C14/35 ,  H01F41/18 ,  C23C14/34 ,  H01J37/34 ,  C23C14/06

    Abstract: A film formation apparatus includes a target containing a magnetic material, a support that supports a substrate and locates the substrate in an arrangement region opposing the target, and a magnetic field formation unit located at a side of the arrangement region opposite to the target. The magnetic field formation unit forms a horizontal magnetic field parallel to an oscillation direction, which is one direction extending along the substrate, at a side of the arrangement region where the target is located. The magnetic field formation unit oscillates the horizontal magnetic field in the oscillation direction at least between one end of the arrangement region and another end of the arrangement region in the oscillation direction.

    VACUUM PROCESSING APPARATUS
    3.
    发明公开
    VACUUM PROCESSING APPARATUS 审中-公开

    公开(公告)号：US20240120233A1

    公开(公告)日：2024-04-11

    申请号：US18263548

    申请日：2022-09-26

    Applicant: ULVAC, INC.

    Inventor： Tetsushi Fujinaga ,  Yukinobu Numata ,  Yasuo Ookubo ,  Daiki Shimada

    IPC: H01L21/687 ,  C23C14/50 ,  H01L21/683

    CPC classification number: H01L21/68742 ,  C23C14/505 ,  H01L21/6831

    Abstract: A vacuum processing apparatus of this invention having a stage on which is disposed the to-be-processed substrate further has a lifting/rotation mechanism capable of lifting the to-be-processed substrate lying on the stage off from an upper surface of the stage to a predetermined height position so that, at this lifted position, the to-be-processed substrate is capable of rotation about a substrate center by a predetermined rotational angle. The lifting/rotation mechanism has: a driving rod built into the stage so as to be moveable up and down and also be rotatable; and a substrate supporting body having a base end plate part capable of contacting a central region, including the substrate center, of the to-be-processed substrate. The substrate supporting body further has at least two arm plate parts elongated from the base end plate part outward thereof.

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