公开(公告)号：US20180306738A1

公开(公告)日：2018-10-25

申请号：US15493120

申请日：2017-04-20

Applicant: UNITED MICROELECTRONICS CORPORATION

Inventor： Chia-Wei LEE ,  Chang-Sheng HSU ,  Chih-Fan HU ,  Chin-Jen CHENG ,  Chang Hsin WU

IPC: G01N27/12

CPC classification number: G01N27/128

Abstract: The present invention provides a structure of a gas sensor, comprising: a support, having a front side, a back side opposite to the front side, a cell region, and a peripheral region circling the cell region; a cavity, formed on the back side of the support in the cell region; a heater, disposed on the front side of the support covering the cavity; a sensing element, disposed on the heater; and a sealing layer, formed on the back side of the support covering inside the cavity.