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公开(公告)号:US12083625B2
公开(公告)日:2024-09-10
申请号:US16839753
申请日:2020-04-03
Applicant: UNITED TECHNOLOGIES CORPORATION
Inventor: Xiaomei Fang , Christopher J. Hertel , John D. Riehl , John W. Connell , Frank L. Palmieri , John W. Hopkins
IPC: B23K26/359 , B23K26/0622 , B23K103/04
CPC classification number: B23K26/359 , B23K26/0622 , B23K2103/05
Abstract: Methods and systems for the laser surface treatment on stainless steel alloys and nickel alloys may include a computer may be programmed to set a laser path corresponding to a predetermined geometric pattern. A laser may be coupled to the computer and apply a pulsed laser beam to a contact surface of the substrate along the predefined geometric pattern. The pulsed laser beam may have a laser power between 0.1 W and 100 W, single pulse fluence 1 mJ/mm2 and 1025 mJ/mm2 and a laser speed between 25.4 cm/s and 127 cm/s. The laser may generate an open pore oxide layer on the contact surface of the substrate with a thickness of 0.1-1 μm, an open pore distance of 0.05-1 μm. The open pore oxide layer may have a topography corresponding to the predefined geometric pattern. The topography may contain open pore structures and promote adhesive bond performance.
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公开(公告)号:US20200316721A1
公开(公告)日:2020-10-08
申请号:US16839753
申请日:2020-04-03
Applicant: UNITED TECHNOLOGIES CORPORATION
Inventor: XIAOMEI FANG , Christopher J. Hertel , John D. Riehl , John W. Connell , Frank L. Palmieri , John W. Hopkins
IPC: B23K26/359 , B23K26/0622
Abstract: Methods and systems for the laser surface treatment on stainless steel alloys and nickel alloys may include a computer may be programmed to set a laser path corresponding to a predetermined geometric pattern. A laser may be coupled to the computer and apply a pulsed laser beam to a contact surface of the substrate along the predefined geometric pattern. The pulsed laser beam may have a laser power between 0.1 W and 100 W, single pulse fluence 1 mJ/mm2 and 1025 mJ/mm2 and a laser speed between 25.4 cm/s and 127 cm/s. The laser may generate an open pore oxide layer on the contact surface of the substrate with a thickness of 0.1-1 μm, an open pore distance of 0.05-1 μm. The open pore oxide layer may have a topography corresponding to the predefined geometric pattern. The topography may contain open pore structures and promote adhesive bond performance.
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