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公开(公告)号：US20220088853A1
公开(公告)日：2022-03-24
申请号：US17604870
申请日：2020-04-20
Applicant: UNIVERSITEIT VAN AMSTERDAM
Inventor： Suhas NAWADA
IPC: B29C64/129 , B33Y30/00 , B33Y10/00 , B29C64/286
Abstract: The invention provides a stereo lithographic 3D printing assembly comprising a digital projection system for projecting a first pattern having a first resolution at a projection location, and a photo mask system for projecting a second pattern having a second resolution at said projection location.
This provides a fast 3D printing assembly allowing high resolution details.
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