专利检索 ap:("UNIVERSITEIT VAN AMSTERDAM") AND inv:"Suhas Nawada" 第 1 页

1.

发明授权
Stereo lithographic 3D printing assembly and stereo lithographic 3D printing method 有权

公开(公告)号：US11518088B2

公开(公告)日：2022-12-06

申请号：US17604870

申请日：2020-04-20

申请人： UNIVERSITEIT VAN AMSTERDAM

发明人： Suhas Nawada

IPC分类号： B29C64/286 , B29C64/129 , B33Y10/00 , B33Y30/00

摘要： The invention provides a stereo lithographic 3D printing assembly comprising a digital projection system for projecting a first pattern having a first resolution at a projection location, and a photo mask system for projecting a second pattern having a second resolution at said projection location. This provides a fast 3D printing assembly allowing high resolution details.