PHOTONIC CHIP AND METHOD OF MANUFACTURE

    公开(公告)号:US20220214498A1

    公开(公告)日:2022-07-07

    申请号:US17605500

    申请日:2020-04-24

    Abstract: The invention provides a photonic chip comprising: a silicon substrate, an low refractive index layer above the silicon substrate, and a tapered waveguide above the low refractive index layer, the tapered waveguide having a first height at a first end of the tapered waveguide and a second height at a second end of the tapered waveguide, the second height being greater than the first height, and the tapered waveguide having a bottom surface that is closer to the substrate at the second end than at the first end. The invention further provides a method of manufacturing a photonic chip, the method comprising: providing a wafer comprising a silicon substrate, and an low refractive index layer above the silicon substrate, etching the low refractive index layer to form a tapered trench having a first height at a first end of the tapered trench and a second height at a second end of the tapered trench, the first second height being greater than the second first height, and the tapered trench having a bottom surface that is closer to the substrate at the first second end than at the second first end, and forming a tapered waveguide in the tapered trench.

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