公开(公告)号：US20200064188A1

公开(公告)日：2020-02-27

申请号：US16485870

申请日：2018-02-13

Applicant: UNIVERSITY OF THE WEST OF SCOTLAND

Inventor： EWAN WADDELL ,  DESMOND GIBSON

IPC: G01J3/10 ,  G01J3/12 ,  G01J3/02 ,  G01J3/42

Abstract: An optical sensor for multispectral analysis of a fluid sample comprises at least one light source, at least one interference filter, and a plurality of light detectors arranged such that light emitted by the at least one light source is incident on the at least one interference filter. There is a spatial variation in the intensity of light incident on the said at least one interference filter.

公开(公告)号：US20210341335A1

公开(公告)日：2021-11-04

申请号：US17375897

申请日：2021-07-14

Applicant: UNIVERSITY OF THE WEST OF SCOTLAND

Inventor： EWAN WADDELL ,  DESMOND GIBSON

IPC: G01J3/10 ,  G01J3/02 ,  G01J3/12 ,  G01J3/42

Abstract: An optical sensor for multispectral analysis of a fluid sample comprises at least one light source, at least one interference filter, and a plurality of light detectors arranged such that light emitted by the at least one light source is incident on the at least one interference filter. There is a spatial variation in the intensity of light incident on the said at least one interference filter.

公开(公告)号：US20190390324A1

公开(公告)日：2019-12-26

申请号：US16485862

申请日：2018-02-13

Applicant: UNIVERSITY OF THE WEST OF SCOTLAND

Inventor： SHIGENG SONG ,  DESMOND GIBSON ,  DAVID HUTSON

IPC: C23C14/35 ,  C23C14/04 ,  C03C17/34 ,  H01J37/34 ,  G02B5/28

Abstract: Apparatus for depositing one or more variable interference filters onto one or more substrates comprises a vacuum chamber, at least one magnetron sputtering device and at least one movable mount for supporting the one or more substrates within the vacuum chamber. The at least one magnetron sputtering device is configured to sputter material from a sputtering target towards in the mount, thereby defining a sputtering zone within the vacuum chamber. At least one static sputtering mask is located between the sputtering target and the mount. The at least one static sputtering mask is configured such that, when each substrate is moved through the sputtering zone on the at least one movable mount, a layer of material having a non-uniform thickness is deposited on each said substrate.