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1.发明公开公开(公告)号：US20240319611A1
公开(公告)日：2024-09-26
申请号：US18306995
申请日：2023-04-25
Applicant: United Microelectronics Corp.
Inventor： Zhi Fan Sun , Kuo Feng Huang , Ming Hsien Chung , Hua-Wei Peng , Chih Chung Kuo
CPC classification number: G03F7/70341 , G01F23/14 , G03F7/70525
Abstract: A lithography system includes an immersion lithographic apparatus, a fluid supply device, and a sensor. The fluid supply is configured to supply fluid to the immersion lithographic apparatus. The fluid supply device includes at least one liquid storage tank, an upper liquid pipe and a lower liquid pipe connected to the liquid storage tank. The sensor includes at least one hydraulic pressure gauge. The at least one hydraulic pressure gauge is arranged near a lower part of the liquid storage tank and connected to the lower liquid pipe and the upper liquid pipe so as to measure the hydraulic pressure at a bottom of the liquid storage tank. The height of the liquid level in the liquid storage tank is calculated from the hydraulic pressure.
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2.发明授权公开(公告)号：US12259657B2
公开(公告)日：2025-03-25
申请号：US18306995
申请日：2023-04-25
Applicant: United Microelectronics Corp.
Inventor： Zhi Fan Sun , Kuo Feng Huang , Ming Hsien Chung , Hua-Wei Peng , Chih Chung Kuo
Abstract: A lithography system includes an immersion lithographic apparatus, a fluid supply device, and a sensor. The fluid supply is configured to supply fluid to the immersion lithographic apparatus. The fluid supply device includes at least one liquid storage tank, an upper liquid pipe and a lower liquid pipe connected to the liquid storage tank. The sensor includes at least one hydraulic pressure gauge. The at least one hydraulic pressure gauge is arranged near a lower part of the liquid storage tank and connected to the lower liquid pipe and the upper liquid pipe so as to measure the hydraulic pressure at a bottom of the liquid storage tank. The height of the liquid level in the liquid storage tank is calculated from the hydraulic pressure.
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