Selective OLED vapor deposition using electric charges
    1.
    发明授权
    Selective OLED vapor deposition using electric charges 有权
    使用电荷的选择性OLED气相沉积

    公开(公告)号:US08969116B2

    公开(公告)日:2015-03-03

    申请号:US13745036

    申请日:2013-01-18

    CPC classification number: B05B5/03 C23C14/04 C23C14/12 H01L51/0003 H01L51/56

    Abstract: A selective organic emissive material deposition technique is disclosed. A charged organic emissive material may be mixed with a carrier gas and ejected towards a charged intended area of a substrate. The charge for the emissive material may be such that the organic emissive material is attracted to the charged intended area of the substrate and, accordingly, deposited selectively over the charged intended area of the substrate. Additionally, surrounding unintended areas of the substrate may be charged such that the charged organic emissive material is repelled by the unintended areas.

    Abstract translation: 公开了选择性有机发射材料沉积技术。 带电的有机发射材料可以与载气混合并朝向基底的带电的预期区域喷射。 发射材料的电荷可以使得有机发射材料被吸引到衬底的带电的预期区域,并且因此选择性地沉积在衬底的带电的预期区域上。 此外,衬底的周围的非预期区域可以被充电,使得带电的有机发射材料被非预期区域击退。

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