WALL SHEAR STRESS SENSOR AND SYSTEM
    1.
    发明公开

    公开(公告)号:US20240077371A1

    公开(公告)日:2024-03-07

    申请号:US18272198

    申请日:2021-12-14

    CPC classification number: G01L1/24 G01B11/16

    Abstract: A wall shear stress sensor comprising first and second optical gratings, an incident light source and a photodetector. The second optical grating overlaps the first optical grating such that the first optical grating and second optical grating form a Moiré fringe pattern, wherein the second optical grating is displaceable relative to the first optical grating in response to a wall shear stress imparted on the sensor, and wherein displacement of the second optical grating correlates with a phase shift in the Moiré fringe pattern. The incident light source is configured to sequentially illuminate a plurality of discrete locations distributed across the Moiré fringe pattern. The photodetector is configured to detect light intensity reflected from each discrete location on the Moiré fringe pattern. A method of using the sensor and a two dimensional wall shear stress sensor system are also disclosed.

    WALL SHEAR STRESS SENSOR
    2.
    发明公开

    公开(公告)号:US20240068892A1

    公开(公告)日:2024-02-29

    申请号:US18272269

    申请日:2021-12-14

    CPC classification number: G01L1/242

    Abstract: A two-dimensional wall shear stress sensor comprising fixed and floating substrates, an incident light source and first and second photodetectors. The fixed substrate supports a first plurality of optical gratings. The floating substrate supports a second plurality of optical gratings superimposed over the first plurality of optical gratings to form a plurality of Moire fringe patterns comprising at least a first Moire fringe pattern extending in a first direction and a second Moire fringe pattern extending in a second direction different to the first direction. The floating substrate is displaceable relative to the fixed substrate in response to a wall shear stress imparted on the sensor, wherein displacement of the floating substrate correlates with a phase shift in at least one of the first and second Moire fringe patterns. An incident light source is configured to illuminate each of the plurality of Moire fringe patterns. The first photodetector system is configured to detect intensity of light reflected from the first Moire fringe pattern. The second photodetector system is configured to

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