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1.发明申请Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby 有权多层光谱纯度滤光片，包括这种光谱纯度滤光片的光刻设备，器件制造方法以及由此制造的器件公开(公告)号：US20060221440A1
公开(公告)日：2006-10-05
申请号：US11091923
申请日：2005-03-29
CPC分类号： G03F7/70916 , G03F7/70191 , G03F7/70308 , G03F7/70575 , G03F7/70941
摘要： A multi-layered spectral purity filters improveS the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam and also collect debris emitted from a radiation source.
摘要翻译： 多层光谱纯度滤光片提高极紫外（EUV）辐射束的光谱纯度，并且还收集从辐射源发射的碎片。
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2.发明授权Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby 有权多层光谱纯度滤光片，包括这种光谱纯度滤光片的光刻设备，器件制造方法以及由此制造的器件公开(公告)号：US07372623B2
公开(公告)日：2008-05-13
申请号：US11091923
申请日：2005-03-29
申请人： Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Leonid Shmaenok , Nikolay Salashchenko
发明人： Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Leonid Shmaenok , Nikolay Salashchenko
IPC分类号： G02B5/20
CPC分类号： G03F7/70916 , G03F7/70191 , G03F7/70308 , G03F7/70575 , G03F7/70941
摘要： A multi-layered spectral purity filter improves the spectral purity of extreme ultra-violet (EUV) radiation and also collects debris emitted from a radiation source.
摘要翻译： 多层光谱纯度过滤器提高了极紫外（EUV）辐射的光谱纯度，并且还收集了辐射源发射的碎屑。
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