公开(公告)号：US06492625B1

公开(公告)日：2002-12-10

申请号：US09671527

申请日：2000-09-27

申请人： Vadim Boguslavskiy ,  Alexander Gurary ,  Ameesh Patel ,  Jeffrey Ramer

发明人： Vadim Boguslavskiy ,  Alexander Gurary ,  Ameesh Patel ,  Jeffrey Ramer

IPC分类号： H05B102

CPC分类号： G01J5/0022 ,  C23C16/46 ,  C23C16/52 ,  H01L21/67248 ,  H01L21/68764 ,  H01L21/68771

摘要： An apparatus and method for providing substantially uniform substrate temperature in a chemical vapor deposition reaction chamber is provided. The method and apparatus utilize a carrier for holding at least one substrate in the reaction chamber and a plurality of heating elements arranged to heat the carrier and the at least one substrate. At least one substrate pyrometer measures the temperature of the substrates to provide a signal representing the process temperature. This signal is used in a feedback loop to control one or more of the heating elements. At least two carrier pyrometers focused at different zones of the carrier are provided. The signals from the carrier pyrometers are compared to one another to provide an indication of temperature non-uniformity. This indication is used in a separate feedback loop to adjust other heating elements so as to maintain temperature uniformity across the carrier.

摘要翻译： 提供了一种用于在化学气相沉积反应室中提供基本均匀的衬底温度的装置和方法。 该方法和装置利用载体将至少一个基板保持在反应室中，以及布置成加热载体和至少一个基板的多个加热元件。 至少一个基板高温计测量基板的温度以提供表示工艺温度的信号。 该信号用于反馈回路中以控制一个或多个加热元件。 提供聚焦在载体的不同区域的至少两个载体高温计。 将来自载体高温计的信号彼此比较以提供温度不均匀性的指示。 该指示用于单独的反馈回路以调整其他加热元件，以便保持载体上的温度均匀性。