公开(公告)号：US20060079160A1

公开(公告)日：2006-04-13

申请号：US10962890

申请日：2004-10-12

申请人： Venkata Balagani ,  George Lazari ,  Kenny Ngan

发明人： Venkata Balagani ,  George Lazari ,  Kenny Ngan

IPC分类号： B24B29/00

CPC分类号： B24B53/017 ,  B24B53/12

摘要： A polishing pad conditioner comprises a base and a pad conditioning face on the base. The conditioning face comprises central and peripheral regions. Abrasive spokes having a substantially constant width of abrasive particles, extend from the central to the peripheral region. The spokes are symmetric and radially spaced apart from one another, and may have a variety of shapes. The conditioning face can also have a cutout inlet channel to receive polishing slurry when the conditioning face is rubbed against a polishing pad, a conduit to receive the polishing slurry from the cutout inlet channel, and an outlet on the peripheral edge of the base to discharge the received polishing slurry.

摘要翻译： 抛光垫调节器包括底座和底座上的垫调节面。 调理面包括中央和周边区域。 具有基本恒定的磨料颗粒宽度的研磨轮辐从中心延伸到周边区域。 轮辐是对称的并且彼此径向间隔开，并且可以具有各种形状。 调理面还可以具有切口入口通道，用于在将调理面摩擦抛光垫时接收抛光浆料，从切口入口通道接收抛光浆料的导管，以及在基部周边的出口排出 接收的抛光浆料。

公开(公告)号：US07066795B2

公开(公告)日：2006-06-27

申请号：US10962890

申请日：2004-10-12

申请人： Venkata R. Balagani ,  George Lazari ,  Kenny King-Tai Ngan

发明人： Venkata R. Balagani ,  George Lazari ,  Kenny King-Tai Ngan

IPC分类号： B24B21/18

CPC分类号： B24B53/017 ,  B24B53/12

摘要： A polishing pad conditioner comprises a base and a pad conditioning face on the base. The conditioning face comprises central and peripheral regions. Abrasive spokes having a substantially constant width of abrasive particles, extend from the central to the peripheral region. The spokes are symmetric and radially spaced apart from one another, and may have a variety of shapes. The conditioning face can also have a cutout inlet channel to receive polishing slurry when the conditioning face is rubbed against a polishing pad, a conduit to receive the polishing slurry from the cutout inlet channel, and an outlet on the peripheral edge of the base to discharge the received polishing slurry.

摘要翻译： 抛光垫调节器包括底座和底座上的垫调节面。 调理面包括中央和周边区域。 具有基本恒定的磨料颗粒宽度的研磨轮辐从中心延伸到周边区域。 轮辐是对称的并且彼此径向间隔开，并且可以具有各种形状。 调理面还可以具有切口入口通道，用于在将调理面摩擦抛光垫时接收抛光浆料，从切口入口通道接收抛光浆料的管道，以及在基部周缘上的出口排出 接收的抛光浆料。