公开(公告)号：US20060079160A1

公开(公告)日：2006-04-13

申请号：US10962890

申请日：2004-10-12

申请人： Venkata Balagani ,  George Lazari ,  Kenny Ngan

发明人： Venkata Balagani ,  George Lazari ,  Kenny Ngan

IPC分类号： B24B29/00

CPC分类号： B24B53/017 ,  B24B53/12

摘要： A polishing pad conditioner comprises a base and a pad conditioning face on the base. The conditioning face comprises central and peripheral regions. Abrasive spokes having a substantially constant width of abrasive particles, extend from the central to the peripheral region. The spokes are symmetric and radially spaced apart from one another, and may have a variety of shapes. The conditioning face can also have a cutout inlet channel to receive polishing slurry when the conditioning face is rubbed against a polishing pad, a conduit to receive the polishing slurry from the cutout inlet channel, and an outlet on the peripheral edge of the base to discharge the received polishing slurry.

摘要翻译： 抛光垫调节器包括底座和底座上的垫调节面。 调理面包括中央和周边区域。 具有基本恒定的磨料颗粒宽度的研磨轮辐从中心延伸到周边区域。 轮辐是对称的并且彼此径向间隔开，并且可以具有各种形状。 调理面还可以具有切口入口通道，用于在将调理面摩擦抛光垫时接收抛光浆料，从切口入口通道接收抛光浆料的导管，以及在基部周边的出口排出 接收的抛光浆料。

公开(公告)号：US20060024440A1

公开(公告)日：2006-02-02

申请号：US10901319

申请日：2004-07-27

申请人： Kenneth Tsai ,  Kenny Ngan

发明人： Kenneth Tsai ,  Kenny Ngan

IPC分类号： C23C16/00 ,  B05D1/32

CPC分类号： C23C16/4404 ,  C23C4/131

摘要： A method of forming a coating on a component surface comprises placing a shield about the component surface to define a process zone, controlling the level of oxygen present in the process zone, generating an electric arc in the process zone to form a liquefied material from an electrode, and injecting a carrier gas into the process zone to direct the liquefied material toward the component surface. The level of oxygen present in the process zone is controlled by (i) filling the process zone with a non-oxidizing gas and maintaining a pressure p1 in the process zone higher than a pressure p2 of an ambient environment external to the process zone, and (ii) lining the process zone with an oxygen-absorbing material. Additionally, an arc spray apparatus comprises the shield comprising the oxygen-absorbing material and a consumable electrode extending into the process zone.

摘要翻译： 在部件表面上形成涂层的方法包括在组件表面周围放置屏蔽件以限定工艺区域，控制处理区域中存在的氧气水平，在工艺区域中产生电弧，以形成液化材料 电极，并且将载气注入到处理区域中以将液化材料引向组件表面。 存在于处理区中的氧的水平通过以下步骤来控制：（i）用非氧化性气体填充处理区，并且在高于压力p 1的过程区中保持压力p <1> 2）处理区外部的环境环境，和（ii）用氧吸收材料衬里处理区。 另外，电弧喷涂装置包括包含氧吸收材料的屏蔽件和延伸到工艺区域中的可消耗电极。

公开(公告)号：US20060081459A1

公开(公告)日：2006-04-20

申请号：US10968367

申请日：2004-10-18

申请人： Kenneth Tsai ,  Kenny Ngan

发明人： Kenneth Tsai ,  Kenny Ngan

IPC分类号： C23C14/00

CPC分类号： H01J37/3408 ,  C23C14/35 ,  H01J37/32935

摘要： A target sputtering apparatus capable of monitoring target erosion has a sputtering chamber having a sputtering target with a sputtering surface. The apparatus can have a wireless receiver to receive a wireless signal and a controller to control the receiver and components of the sputtering chamber to sputter-deposit material on a substrate, and monitor erosion of the sputtering surface of the sputtering target. The controller also has a target erosion monitoring code that includes detection wafer transport program code to transport a detection wafer onto the support in the chamber, wherein the detection wafer generates a wireless signal in relation to an extent of erosion of the sputtered surface, and erosion determination code to analyze the wireless signal received by the wireless receiver and originating from the detection wafer to determine an extent of erosion of the sputtering surface of the sputtering target.

摘要翻译： 能够监测目标侵蚀的靶溅射装置具有溅射室，该溅射室具有溅射表面的溅射靶。 该装置可以具有接收无线信号的无线接收器和用于控制溅射室的接收器和部件的溅射沉积材料在基板上的控制器，并监测溅射靶的溅射表面的侵蚀。 控制器还具有目标侵蚀监测代码，其包括检测晶片传送程序代码以将检测晶片传送到腔室中的支撑件上，其中检测晶片相对于溅射表面的侵蚀程度产生无线信号，并且侵蚀 用于分析由无线接收器接收并源自检测晶片的无线信号以确定溅射靶的溅射表面的侵蚀程度的确定代码。

公开(公告)号：US20050205414A1

公开(公告)日：2005-09-22

申请号：US11130493

申请日：2005-05-16

申请人： Kenny Ngan ,  Ying Hui ,  Seshadri Ramaswami

发明人： Kenny Ngan ,  Ying Hui ,  Seshadri Ramaswami

IPC分类号： H05H1/46 ,  C23C14/00 ,  C23C14/04 ,  C23C14/32 ,  C23C14/34 ,  C23C14/35 ,  C25B9/00 ,  C25B11/00 ,  C25B13/00 ,  H01L21/203 ,  H01L21/285 ,  H01L21/4763 ,  H01L21/768

CPC分类号： C23C14/345 ,  C23C14/046 ,  C23C14/34 ,  C23C14/358 ,  H01J37/321 ,  H01J37/34 ,  H01J2237/3327 ,  H01L21/2855 ,  H01L21/76843 ,  H01L21/76877

摘要： Increased sidewall coverage by a sputtered material is achieved by generating an ionizing plasma in a relatively low pressure sputtering gas. By reducing the pressure of the sputtering gas, it is believed that the ionization rate of the deposition material passing through the plasma is correspondingly reduced which in turn is believed to increase the sidewall coverage by the underlayer. Although the ionization rate is decreased, sufficient bottom coverage of the by the material is maintained. In an alternative embodiment, increased sidewall coverage by the material may be achieved even in a high density plasma chamber by generating the high density plasma only during an initial portion of the material deposition. Once good bottom coverage has been achieved, the RF power to the coil generating the high density plasma may be turned off entirely and the remainder of the deposition conducted without the high density plasma. Consequently, it has been found that good sidewall coverage is achieved in the latter part of the deposition.

公开(公告)号：US20060024517A1

公开(公告)日：2006-02-02

申请号：US10910096

申请日：2004-08-02

申请人： Trung Doan ,  Kenny Ngan

发明人： Trung Doan ,  Kenny Ngan

IPC分类号： B32B15/04 ,  B32B19/00

CPC分类号： C23C16/20 ,  C23C16/0227 ,  C23C16/0272 ,  C23C16/56

摘要： A coated aluminum component for a substrate processing chamber comprises an aluminum component having a surface; a first aluminum oxide layer formed on the surface of the aluminum component, the aluminum oxide layer having a surface comprising penetrating surface features; and a second aluminum oxide layer on the first aluminum oxide layer, the second aluminum oxide layer substantially completely filling the penetrating surface features of the first aluminum oxide layer. A method of forming the coated aluminum component is also described.

摘要翻译： 用于基板处理室的涂覆铝部件包括具有表面的铝部件; 形成在铝部件的表面上的第一氧化铝层，所述氧化铝层具有包括穿透表面特征的表面; 和在第一氧化铝层上的第二氧化铝层，第二氧化铝层基本上完全填充第一氧化铝层的穿透表面特征。 还描述了形成涂覆的铝组分的方法。

公开(公告)号：US20050199486A1

公开(公告)日：2005-09-15

申请号：US10799361

申请日：2004-03-12

申请人： Trung Doan ,  Kenny Ngan

发明人： Trung Doan ,  Kenny Ngan

IPC分类号： B22F3/115 ,  C23C4/12 ,  C23C14/34 ,  C23C14/32

CPC分类号： B23K35/0205 ,  B23K11/11 ,  B23K11/16 ,  B23K35/0261 ,  B23K35/286 ,  B23K35/302 ,  C23C4/131 ,  C23C14/3414 ,  C23C26/02

摘要： In a method of refurbishing a deposition target, a surface of the target is provided in a process zone. An electrical arc is generated in the process zone, and a consumable metal wire is inserted into the process zone to form liquefied metal. A pressurized gas is injected into the process zone to direct the liquefied metal toward the surface of the target to splatter the liquefied metal on the surface, thereby forming a coating having the metal on at least a portion of the surface of the target that exhibits reduced contamination from the environment.

摘要翻译： 在翻新沉积靶的方法中，靶的表面设置在处理区中。 在工艺区域产生电弧，并将消耗性金属丝插入加工区以形成液化金属。 将加压气体注入到处理区域中以将液化金属引导到靶的表面以将表面上的液化金属溅射，从而在目标表面的至少一部分表面上形成具有金属的涂层，其表现出减少的 污染环境。