公开(公告)号：US06280490B1

公开(公告)日：2001-08-28

申请号：US09405222

申请日：1999-09-27

申请人： W. Scott Rader ,  David M. Shemo ,  Toshiki Owaki

发明人： W. Scott Rader ,  David M. Shemo ,  Toshiki Owaki

IPC分类号： C09K314

CPC分类号： C09K3/1463 ,  G11B5/8404

摘要： A polishing composition for a memory hard disk, which comprises the following components (a) to (d): (a) from 0.1 to 50 wt %, based on the total amount of the polishing composition, of at least one abrasive selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide, (b) from 0.001 to 10 wt %, based on the total amount of the polishing composition, of at least one iron salt selected from the group consisting of iron nitrate, iron sulfate, ammonium iron sulfate, iron perchlorate, iron chloride, iron citrate, ammonium iron titrate, iron oxalate, ammonium iron oxalate and an iron chelate complex salt of ethylenediaminetetraacetic acid, (c) from 0.01 to 30 wt %, based on the total amount of the polishing composition, of at least one peroxydisulfate salt selected from the group consisting of ammonium peroxydisulfate, potassium peroxydisulfate and sodium peroxydisulfate, and (d) water.

摘要翻译： 一种用于存储硬盘的抛光组合物，其包含以下组分（a）至（d）：（a））：0.1至50重量％，基于抛光组合物的总量，选自 由二氧化硅，氧化铝，氧化铈，氧化锆，氧化钛，氮化硅和二氧化锰组成的组，（b）基于抛光组合物的总量，0.001至10重量％的至少一种铁盐 选自硝酸铁，硫酸铁，硫酸铁铵，高氯酸铁，氯化铁，柠檬酸铁，滴定铁，草酸铁，草酸铁铵和乙二胺四乙酸的铁螯合络合物，（c）0.01 至少30重量％，基于抛光组合物的总量，选自过氧化二硫酸铵，过二硫酸钾和过氧化二硫酸钠中的至少一种过氧化二硫酸盐，和（d）水。

公开(公告)号：US06328774B1

公开(公告)日：2001-12-11

申请号：US09511910

申请日：2000-02-23

申请人： David M. Shemo ,  W. Scott Rader ,  Toshiki Owaki

发明人： David M. Shemo ,  W. Scott Rader ,  Toshiki Owaki

IPC分类号： C09K314

CPC分类号： C09K3/1463 ,  C09G1/02

摘要： A polishing composition for a memory hard disk, which comprises at least the following components (a) to (d): (a) from 0.1 to 50 wt %, based on the total amount of the polishing composition, of at least one abrasive selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide, (b) from 0.001 to 10 wt %, based on the total amount of the polishing composition, of at least one periodate selected from the group consisting of periodic acid, potassium periodate, sodium periodate and lithium periodate, (c) from 0.01 to 30 wt %, based on the total amount of the polishing composition, of at least one peroxydisulfate salt selected from the group consisting of ammonium peroxydisulfate, potassium peroxydisulfate and sodium peroxydisulfate, and (d) water, and which has a pH of from 2 to 7.

摘要翻译： 一种用于存储硬盘的抛光组合物，其至少包含以下组分（a）至（d）：（a））：基于抛光组合物的总量为0.1至50重量％的至少一种研磨剂 来自由二氧化硅，氧化铝，氧化铈，氧化锆，氧化钛，氮化硅和二氧化锰组成的组，（b）基于抛光组合物的总量的0.001至10重量％的至少一种 选自高碘酸，高碘酸钾，高碘酸钠和高碘酸锂的高碘酸盐，（c）基于抛光组合物的总量，0.01至30重量％的至少一种选自以下的过氧化二硫酸盐： 的过二硫酸铵，过二硫酸钾和过氧二硫酸钠，和（d）水，pH为2〜7。

公开(公告)号：US06258140B1

公开(公告)日：2001-07-10

申请号：US09404993

申请日：1999-09-27

申请人： David M. Shemo ,  W. Scott Rader ,  Toshiki Owaki

发明人： David M. Shemo ,  W. Scott Rader ,  Toshiki Owaki

IPC分类号： C09G102

CPC分类号： C09K3/1463 ,  G11B5/8404

摘要： A polishing composition for polishing a memory hard disk, which comprises the following components (a) to (d): (a) from 0.1 to 50 wt %, based on the total amount of the polishing composition, of at least one abrasive selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide, (b) from 0.0001 to 3.0 wt %, based on the total amount of the polishing composition, of at least one polishing resistance-reducing agent selected from the group consisting of a surfactant, a water-soluble polymer and a polyelectrolyte, (c) from 0.001 to 40 wt %, based on the total amount of the polishing composition, of at least one polishing accelerator selected from the group consisting of an inorganic acid, an organic acid and their aluminum, iron, nickel and cobalt salts, and (d) water.

摘要翻译： 一种用于抛光存储硬盘的抛光组合物，其包含以下组分（a）至（d）：（a））：基于抛光组合物的总量为0.1至50重量％的至少一种研磨剂，其选自 由二氧化硅，氧化铝，氧化铈，氧化锆，氧化钛，氮化硅和二氧化锰组成的组，（b）基于抛光组合物的总量的0.0001至3.0重量％的至少一种抛光 选自表面活性剂，水溶性聚合物和聚电解质的抗降低剂，（c）基于抛光组合物的总量，0.001至40重量％的至少一种抛光促进剂，其选自 由无机酸，有机酸及其铝，铁，镍和钴盐组成的组，和（d）水。

公开(公告)号：US06355075B1

公开(公告)日：2002-03-12

申请号：US09502336

申请日：2000-02-11

申请人： Katsuyoshi Ina ,  W. Scott Rader ,  David M. Shemo ,  Tetsuji Hori

发明人： Katsuyoshi Ina ,  W. Scott Rader ,  David M. Shemo ,  Tetsuji Hori

IPC分类号： C09K314

CPC分类号： C09G1/02

摘要： A polishing composition comprising an abrasive, an anticorrosive, an oxidizing agent, an acid, a pH regulator and water and having a pH within a range of from 2 to 5, wherein the abrasive is colloidal silica or fumed silica, and its primary particle size is at most 20 nm.

摘要翻译： 一种抛光组合物，其包含研磨剂，防腐蚀剂，氧化剂，酸，pH调节剂和水，并且pH在2至5的范围内，其中所述研磨剂是胶体二氧化硅或热解法二氧化硅，其初级粒度 至多为20nm。