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公开(公告)号:US09988277B2
公开(公告)日:2018-06-05
申请号:US14888594
申请日:2014-04-15
申请人: WACKER CHEMIE AG
发明人: Dirk Weckesser , Harald Hertlein
IPC分类号: C01B33/03 , B01J8/18 , C01B33/027
CPC分类号: C01B33/03 , B01J8/1809 , B01J8/1827 , B01J8/1872 , B01J2208/00017 , B01J2208/00548 , B01J2208/00628 , B01J2208/00663 , B01J2208/00725 , B01J2208/00752 , B01J2208/00761 , B01J2208/00902 , B01J2208/065 , C01B33/027
摘要: Granular polysilicon is produced in a fluidized-bed reactor by fluidizing silicon particles by means of a gas flow in a fluidized bed heated to a temperature of 850-1100° C., adding a silicon-containing reaction gas by means of a nozzle and depositing of silicon on the silicon particles, wherein, in at least 56% of an axially symmetric region around a nozzle opening of the nozzle, the reaction gas concentration is greater than 75% of the maximum concentration of the reaction gas (10 to 50 mol %), the fluidized-bed temperature is greater than 95% of the fluidized-bed temperature outside the axially symmetric region (850-1100° C.) and the solids concentration is greater than 85% of the solids concentration at the edge of the fluidized bed (55 to 90% by volume).
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公开(公告)号:US11440803B2
公开(公告)日:2022-09-13
申请号:US16469628
申请日:2016-12-14
申请人: WACKER CHEMIE AG
发明人: Harald Hertlein , Dirk Weckesser
IPC分类号: C01B33/03
摘要: The invention relates to a method for producing polycrystalline silicon granulate in a fluidized bed reactor. The method comprises a fluidization of silicon seed particles by means of a fluidizing gas in a fluidized bed, which is heated by a heating device, wherein elemental silicon is deposited by pyrolysis on the silicon seed particles by the addition of a reaction gas containing hydrogen and silane and/or halosilane to form the polycrystalline silicon granulate. In a continuous process, waste gas is discharged from the fluidized bed reactor and hydrogen recovered from said waste to gas is again supplied to the fluidized bed reactor as a circulating gas. The circulating gas has a nitrogen content of less than 1000 ppmv. The invention further relates to polycrystalline silicon granulate having a nitrogen content of less than 2 ppba.
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公开(公告)号:US10363534B2
公开(公告)日:2019-07-30
申请号:US15525631
申请日:2015-11-03
申请人: Wacker Chemie AG
IPC分类号: B01J8/18 , C01B33/027 , C01B33/029 , C23C16/24
摘要: Assembly of a fluidized bed reactor for the preparation of polycrystalline silicon granules by chemical vapor deposition of silicon onto seed particles and removal of polycrystalline silicon granules is facilitated without breakage and with gas tightness by a specific assembly sequence.
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公开(公告)号:US10526206B2
公开(公告)日:2020-01-07
申请号:US14899143
申请日:2014-06-17
申请人: Wacker Chemie AG
发明人: Dirk Weckesser
IPC分类号: C01B33/107 , C01B33/03
摘要: Yield of products of increased purity from a fluidized bed reactor where silicon is produced or consumed is enhanced by purging with inert gas, purging with hydrogen gas, and purging with a chlorosilane-containing gas. The purging with hydrogen is conducted at an elevated temperature.
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公开(公告)号:US10258951B2
公开(公告)日:2019-04-16
申请号:US15126921
申请日:2015-03-12
申请人: Wacker Chemie AG
发明人: Dirk Weckesser
IPC分类号: C01B33/027 , B01J8/18 , B01J8/42
摘要: A reactor for preparing granular polysilicon by deposition of polycrystalline silicon on silicon seed particles has a reaction vessel, an inner reactor tube for a fluidized bed comprising granular polysilicon and a reactor bottom within the reactor vessel, a heating device for heating the fluidized bed in the inner reactor tube, at least one bottom gas nozzle for introduction of fluidizing gas and at least one reaction gas nozzle for introduction of reaction gas, a feed device to introduce silicon seed particles, an offtake line for granular polysilicon, and a device for discharging reactor offgas from the reactor vessel, and has a cylindrical component which has openings on its cylindrical surface, with at least 5% and not more than 95% of the cylindrical surface being open located between the inner reactor tube and the heating device.
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公开(公告)号:US09732420B2
公开(公告)日:2017-08-15
申请号:US14891458
申请日:2014-05-06
申请人: WACKER CHEMIE AG
发明人: Dirk Weckesser
IPC分类号: C23C14/44 , C23C16/44 , C01B33/035 , C23C16/24 , C23C16/442 , B24C1/08 , B24C11/00 , C01B33/027 , B01D45/16 , B01D50/00
CPC分类号: C23C16/4407 , B01D45/16 , B01D46/0019 , B01D50/002 , B24C1/086 , B24C11/00 , C01B33/027 , C01B33/035 , C23C16/24 , C23C16/4412 , C23C16/442
摘要: Silicon deposited by CVD and/or silico dust is removed from a polycrystalline silicon deposition reactor component by abrasion with silicon-containing particles in a gas stream.
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