Advancing workpieces through a sputtering chamber
    1.
    发明授权
    Advancing workpieces through a sputtering chamber 失效
    通过喷射室进行工作

    公开(公告)号:US3584847A

    公开(公告)日:1971-06-15

    申请号:US3584847D

    申请日:1968-05-31

    CPC classification number: C23C14/56 Y10S414/137 Y10S414/139

    Abstract: An apparatus for depositing a thin film of tantalum to workpieces includes a sputtering chamber and entrance and exit chambers located at opposite ends of and communicating with the sputtering chamber. Sealing devices are provided for isolating the sputtering chamber from the entrance and exit chambers. A reciprocating conveyor having a central conveyor section located within the sputtering chamber, and first and second conveyor sections, located in the entrance and exit chambers, respectively, and which sections may all be connected together, is provided for advancing workpieces from a first magazine in the entrance chamber, through the sputtering chamber, to a second magazine in the exit chamber.

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