公开(公告)号：US20150182987A1

公开(公告)日：2015-07-02

申请号：US14408496

申请日：2013-07-10

Applicant: WIELAND-WERKE AG

Inventor： Wolfram Schillinger ,  Thomas Klassen ,  Kerstin-Raffaela Ernst

IPC: B05C21/00 ,  B05D1/32 ,  B05C5/02 ,  B05D1/02

CPC classification number: B05C21/005 ,  B05B7/14 ,  B05B7/16 ,  B05B12/22 ,  B05B13/0207 ,  B05C5/025 ,  B05D1/02 ,  B05D1/32

Abstract: The invention relates to a mask for a coating system having a covering device for an area not to be coated of a substrate to be coated, having a working side exposed to the material flow of the coating material, wherein the covering device for the area not to be coated is comprised of at least one disk that can be rotated, the disk upper side of which is positioned vertically to the material flow of the coating material. A further aspect of the invention includes a thermal and/or kinetic coating system having at least one spray device, and a corresponding method for producing a coated substrate.

Abstract translation: 本发明涉及一种用于涂层系统的掩模，其具有用于不要涂覆的基底的区域的覆盖装置，其具有暴露于涂料的材料流的工作侧，其中该区域的覆盖装置不 被涂覆的至少一个盘可以旋转，其盘的上侧垂直于涂层材料的材料流动。 本发明的另一方面包括具有至少一种喷雾装置的热和/或动力学涂料体系以及用于制备涂覆的基材的相应方法。