公开(公告)号：US20120001258A1

公开(公告)日：2012-01-05

申请号：US13175202

申请日：2011-07-01

申请人： Wan Soo KIM

发明人： Wan Soo KIM

IPC分类号： H01L29/78 ,  H01L21/336

CPC分类号： H01L29/42364 ,  H01L27/10876 ,  H01L29/4236 ,  H01L29/42368 ,  H01L29/66545 ,  H01L29/66621

摘要： A semiconductor device includes a gate metal buried within a trench included in a semiconductor substrate including an active region defined by an isolation layer, a spacer pattern disposed on an upper portion of a sidewall of a gate metal, a first gate oxide layer disposed between the spacer pattern and the trench, a second gate oxide layer disposed below the first gate oxide layer and the gate metal, and a junction region disposed in the active region to overlap the first gate oxide layer.

摘要翻译： 半导体器件包括掩埋在包括在半导体衬底内的沟槽内的栅极金属，所述沟槽包括由隔离层限定的有源区，设置在栅极金属的侧壁的上部的间隔图案，设置在栅极金属的侧壁的上部的第一栅极氧化物层 间隔物图案和沟槽，设置在第一栅极氧化物层和栅极金属之下的第二栅极氧化物层，以及设置在有源区中以与第一栅极氧化物层重叠的结区。

公开(公告)号：US20100276414A1

公开(公告)日：2010-11-04

申请号：US12764179

申请日：2010-04-21

申请人： Hyeun Sik NAM ,  Dong Seong KWAG ,  Wan Soo KIM

发明人： Hyeun Sik NAM ,  Dong Seong KWAG ,  Wan Soo KIM

IPC分类号： A21B1/00

CPC分类号： F24C15/16

摘要： A cooking range includes a cook top section. The cooking range also include an oven section having walls defining a cavity and a door, wherein the cavity being configured to accommodate food and the door being configured to open or close the cavity. The cooking range further include a heating source configured to provide heat to the cavity when the cooking range is operated. In addition, the cooking range include a rack member coupled to the cavity, and configured to support a food container placed thereon, wherein at least a part of the rack member is configured to be rotated to rotate the food thereon.

摘要翻译： 烹饪范围包括烹饪顶部。 烹饪范围还包括具有限定空腔和门的壁的烤箱部分，其中所述空腔被配置为容纳食物，并且所述门被构造成打开或关闭空腔。 烹饪范围还包括加热源，其被配置为当烹饪范围被操作时向腔提供热量。 此外，烹饪范围包括联接到空腔的齿条构件，并且构造成支撑放置在其上的食物容器，其中齿条构件的至少一部分被构造成旋转以在其上旋转食物。

公开(公告)号：US20070145033A1

公开(公告)日：2007-06-28

申请号：US11616991

申请日：2006-12-28

申请人： Wan Soo KIM ,  Yong Woo LEE

发明人： Wan Soo KIM ,  Yong Woo LEE

IPC分类号： F27D11/00

CPC分类号： F24C15/325

摘要： An electric oven is provided. The electric oven includes a chamber, a heater that heats air in the chamber and a flow guide defining a cooking space for food therein. The flow guide uniformly transfers heated air in the chamber to the food in the cooking space. The flow guide includes a body for covering the food and an exhaust for exhausting air that flows into the body.

摘要翻译： 提供电烤炉。 电烤箱包括一个室，一个加热室，加热室中的空气和一个流动导向器，用于限定食物的烹饪空间。 流动引导件将腔室中的加热空气均匀地转移到烹饪空间中的食物。 流动引导件包括用于覆盖食物的主体和用于排出流入身体的空气的排气。

公开(公告)号：US20090162990A1

公开(公告)日：2009-06-25

申请号：US12100455

申请日：2008-04-10

申请人： Sang Tae AHN ,  Ja Chun KU ,  Eun Jeong KIM ,  Wan Soo KIM

发明人： Sang Tae AHN ,  Ja Chun KU ,  Eun Jeong KIM ,  Wan Soo KIM

IPC分类号： H01L21/76

CPC分类号： H01L21/823481 ,  H01L21/76224

摘要： A method for manufacturing a semiconductor device that can prevent the loss of an isolation structure and that can also stably form epi-silicon layers is described. The method for manufacturing a semiconductor device includes defining trenches in a semiconductor substrate having active regions and isolation regions. The trenches are partially filled with a first insulation layer. An etch protection layer is formed on the surfaces of the trenches that are filled with the first insulation layer. A second insulation layer is filled in the trenches formed with the etch protection layer to form an isolation structure in the isolation regions of the semiconductor substrate. Finally, portions of the active regions of the semiconductor substrate are recessed such that the isolation structure has a height higher than the active regions of the semiconductor substrate.

摘要翻译： 描述了可以防止隔离结构的损失并且还可以稳定地形成外延硅层的半导体器件的制造方法。 半导体器件的制造方法包括在具有有源区和隔离区的半导体衬底中限定沟槽。 沟槽部分地填充有第一绝缘层。 在填充有第一绝缘层的沟槽的表面上形成蚀刻保护层。 在由蚀刻保护层形成的沟槽中填充第二绝缘层，以在半导体衬底的隔离区域中形成隔离结构。 最后，半导体衬底的有源区的部分被凹入，使得隔离结构的高度高于半导体衬底的有源区。

公开(公告)号：US20070204847A1

公开(公告)日：2007-09-06

申请号：US11673776

申请日：2007-02-12

申请人： Young Woo LEE ,  Wan Soo KIM

发明人： Young Woo LEE ,  Wan Soo KIM

IPC分类号： F24C15/04 ,  F23M7/00

CPC分类号： H05B6/763 ,  H05B6/6414

摘要： A door assembly for an oven includes a door configured to open and close a heating chamber of an oven, and a glass substrate removably mounted to a surface of the door facing the heating chamber. An oven includes a housing having a heating chamber formed therein for irradiation of microwaves into the heating chamber. A door is configured to open and close the heating chamber, the door having a filter that prevents microwaves from leaking from the heating chamber. A glass substrate is removably mounted to a surface of the door facing the heating chamber.

摘要翻译： 用于烤箱的门组件包括：门，其构造成打开和关闭烤箱的加热室;以及玻璃基板，可移除地安装在面向加热室的门的表面上。 烘箱包括具有形成在其中用于将微波照射到加热室中的加热室的壳体。 门构造成打开和关闭加热室，门具有防止微波从加热室​​泄漏的过滤器。 玻璃基板可拆卸地安装在面向加热室的门的表面上。

公开(公告)号：US20170029279A1

公开(公告)日：2017-02-02

申请号：US15149612

申请日：2016-05-09

申请人： Wan Soo KIM ,  Jung Hee HAN ,  Byung Hee HONG

发明人： Wan Soo KIM ,  Jung Hee HAN ,  Byung Hee HONG

IPC分类号： C01B31/04 ,  C23C16/26 ,  H01J37/32 ,  C23C16/50

CPC分类号： C01B32/186 ,  B32B37/025 ,  B32B37/10 ,  C23C16/26

摘要： Disclosed is an apparatus and method of manufacturing a graphene film, wherein the apparatus includes a wrinkle flattening device configured to flatten wrinkles in a lamination structure including a base substrate and a graphene film laminated on the base substrate; and a first lamination apparatus configured to laminate a first substrate on the graphene film, wherein the wrinkle flattening device applies a vacuum to the base substrate when the wrinkle flattening device is in contact with the base substrate.

摘要翻译： 公开了一种制造石墨烯薄膜的装置和方法，其中该装置包括皱纹平整装置，其被构造成使叠层结构中的褶皱平坦化，所述叠层结构包括基底基板和层压在基底基板上的石墨烯薄膜; 以及第一层压装置，其被配置为将第一基板层叠在所述石墨烯膜上，其中，当所述褶皱变平装置与所述基底基板接触时，所述皱纹变平装置向所述基底基板施加真空。

公开(公告)号：US20100276413A1

公开(公告)日：2010-11-04

申请号：US12764155

申请日：2010-04-21

申请人： Hyeun Sik NAM ,  Dong Seong KWAG ,  Wan Soo KIM

发明人： Hyeun Sik NAM ,  Dong Seong KWAG ,  Wan Soo KIM

IPC分类号： A21B1/00

CPC分类号： F24C15/006

摘要： A cooking range includes a cook top section having a heating body configured to cook foods; an oven section having a cavity and a door, wherein the cavity has a rack configured to accommodate foods and the door is configured to open or close the cavity; a heating source configured to provide heat to the cavity when the cooking range is operated; and an air circulation mechanism having a first duct, a second duct and a fan and configured to discharge air provided from the first duct positioned at a surface of the cavity through the second duct in response to rotation of the fan, wherein the air circulation mechanism is configured to discharge air from the top section through the second duct while the air provided from the first duct is discharged.

摘要翻译： 烹饪区域包括烹饪顶部部分，其具有构造成烹饪食物的加热体; 具有空腔和门的烤箱部分，其中所述空腔具有构造成容纳食物的齿条，并且所述门构造成打开或关闭所述空腔; 加热源，其构造成当所述烹饪范围操作时向所述空腔提供热量; 以及具有第一管道，第二管道和风扇的空气循环机构，其构造为响应于风扇的旋转，通过第二管道排出位于空腔的表面的第一管道所提供的空气，其中空气循环机构 被配置为从第一管道提供的空气排放时，从顶部排出空气通过第二管道。

公开(公告)号：US20100276412A1

公开(公告)日：2010-11-04

申请号：US12762397

申请日：2010-04-19

申请人： Hyeun Sik NAM ,  Dong Seong KWAG ,  Wan Soo KIM

发明人： Hyeun Sik NAM ,  Dong Seong KWAG ,  Wan Soo KIM

IPC分类号： A21B1/00

CPC分类号： F24C15/006

摘要： A cooking range is disclosed. The range includes: a cook top section having a heating body configured to cook foods; an oven section having internal walls defining a cavity, a rack and a door, wherein the cavity is configured to accommodate the foods placed on the rack and the door is configured to open or close the cavity; a heating source configured to provide heat to the cavity when the cooking range is operated; and an air circulation mechanism having an exhaust slot and at least one suction slot and configured to suck air into the cooking range through the at least one suction slot and to discharge the air to the outside through the exhaust slot, wherein the at least one suction slot is positioned around the exhaust slot.

摘要翻译： 公开了烹饪范围。 该范围包括：烹饪顶部，其具有构造成烹饪食物的加热体; 具有限定空腔的内壁，炉架和门的烤箱部分，其中所述空腔被配置为容纳放置在所述搁架上的食物，并且所述门被构造成打开或关闭所述空腔; 加热源，其构造成当所述烹饪范围操作时向所述空腔提供热量; 以及空气循环机构，其具有排气狭槽和至少一个吸入槽，并且构造成通过所述至少一个吸入槽将空气吸入所述烹饪范围，并且通过所述排气槽将空气排出到外部，其中所述至少一个吸力 槽位于排气槽周围。

公开(公告)号：US20090242542A1

公开(公告)日：2009-10-01

申请号：US12390177

申请日：2009-02-20

申请人： Dong Seong KWAG ,  Hyeun Sik NAM ,  Wan Soo KIM ,  Seong Ho CHO ,  Jae Kyung YANG

发明人： Dong Seong KWAG ,  Hyeun Sik NAM ,  Wan Soo KIM ,  Seong Ho CHO ,  Jae Kyung YANG

IPC分类号： A21B1/00

CPC分类号： F24C15/006 ,  F24C15/2007 ,  F24C15/32

摘要： An electric oven has an air passage structure that is designed to effectively cool down electric components. The air passage structure quickly cools down a variety of electric components on a top surface of a cavity using air introduced from outside the oven. The oven has a series of passages and openings allowing the effective movement of air past the electric components and through the oven.

摘要翻译： 电烤炉具有设计成有效地冷却电气部件的空气通道结构。 空气通道结构使用从炉外引入的空气迅速冷却空腔顶表面上的各种电气部件。 烤箱具有一系列通道和开口，允许空气有效地运动通过电气部件并通过烤箱。

公开(公告)号：US20080216758A1

公开(公告)日：2008-09-11

申请号：US11863829

申请日：2007-09-28

申请人： Wan Soo KIM

发明人： Wan Soo KIM

IPC分类号： A01K61/00 ,  A01K63/00

CPC分类号： A01K63/02

摘要： A method and an apparatus for inducing artificial hibernation of marine animal, wherein the temperature of sea water with marine animals is gradually lowered in stepwise process, while the sea water temperature is kept as is for a predetermined period of time at each step of lowering temperature, whereby the predetermined period of time maintained for each step of the lowered temperature is gradually increased to a point where changes of oxygen consumption by the marine animals greatly decreased or the changes of oxygen consumption is reached almost zero, and starting from this point, the time of constantly maintaining the sea water temperature at each step is gradually reduced to thereby ensuring a long survival rate (viability) of marine animals.

摘要翻译： 一种用于诱导海洋动物人造冬眠的方法和装置，其中随着海洋动物的海水温度逐步降低，同时在降低温度的每个步骤期间将海水温度保持为预定时间段 由此，将降低温度的各步骤保持的规定时间逐渐增加到海洋动物的氧消耗变化大大降低或氧消耗变化达到几乎为零的点，从这一点开始 不断维持每一步海水温度的时间逐渐减少，从而确保了海洋动物的长寿命（生存能力）。