摘要:
An electron injection structure for the beam guide meshes of a flat panel display has apertures with different dimensions to optimize beam focusing for different purposes. The first period of apertures has strong focusing normal to the plan of the guide meshes. A plurality of periods have strong focusing in a direction parallel to the lateral dimension of the guide meshes. Another plurality of apertures matches the beams to the propagation section of the beam guide.
摘要:
An electron beam injection structure for flat panel display device includes electron injection electrodes which span a beam guide assembly for propagating electron beams. One end of the electron injection electrodes is in closer proximity to the cathode than the corresponding end of the beam guide structure. The injection of electrons from the cathode to the beam guide structure therefore can be maximized by increasing the voltage on the electron injection electrodes while permitting changes in the operating voltages applied to the beam guide structure and other elements of the display device.
摘要:
The electron gun includes a pair of electrodes between which a resistive lens structure comprising a stack of alternate apertured plates and resistive blocks is disposed. A first portion of the resistive stack is electrically paralleled with another stack of resistive blocks whereby bleeder current through the resistive lens structure results in a compound linear potential profile. The other stack of resistive blocks may comprise a second stack in the same lens structure interleaved with the apertured plates of the lens structure or it may constitute together with a different set of aperture plates a second resistive lens structure between a different pair of electrodes of the gun.
摘要:
An alignment layer for a liquid crystal display device provides optimum molecular alignment, tilt angle and resistivity by depositing a glow discharge layer comprised of carbon, nitrogen, and hydrogen onto the electrodes of the liquid crystal cell.
摘要:
The electron gun comprises an electron lens assembly including a pair of terminal electrodes fixedly mounted along a pair of glass support rods. Disposed between the terminal electrodes is a resistive lens stack of alternate apertured electrode plates and resistive spacer blocks. The electrode plates and resistive spacer blocks are urged into good electrical contact with each other and with the terminal electrodes by a plurality of leaf springs. The electrode plates are preferably lightly contacted by the glass support rods to prevent lateral movement of the plates without preventing their spring-urged contact with the resistive blocks.
摘要:
An improvement is made in a color picture tube having an inline electron gun for generating and directing a plurality of electron beams along coplanar paths toward a screen of the tube. The gun includes a main focus lens for focusing the electron beams which is formed by two spaced electrodes. Each electrode includes a portion having a plurality of apertures therein equal to the number of electron beams. Each electrode also includes a peripheral rim. The peripheral rims of the two electrodes face each other and the apertured portion of each electrode is within a recess set back from the rim. The improvement comprises the depths of the apertures in the electrodes being equal to the thickness of material of the electrodes. This aperture structure permits greater penetration of the electrostatic lines of the main focus lens into the electrodes behind the apertured portions of the electrodes. This penetration of electrostatic lines provides a converging field for off-axis electron beams.
摘要:
The electron gun includes a pair of electrodes between which a resistive lens structure comprising a stack of alternate apertured plates and resistive blocks is disposed. The stack comprises a first section which has two resistive blocks between each adjacent pair of electrode plates and a second section which has one resistive block between each adjacent pair of electrode plates. The lens is thereby adapted to operate with a potential profile which comprises a compound linear slope in a 1:2 ratio.