System for evaluating thin film coatings
    1.
    发明授权
    System for evaluating thin film coatings 失效
    薄膜涂层评估系统

    公开(公告)号:US5772861A

    公开(公告)日:1998-06-30

    申请号:US541201

    申请日:1995-10-16

    IPC分类号: C23C14/54 C23C14/56

    摘要: A system for evaluating the reflectance of an object (e.g., a CRT) that is coated with an anti-reflective coating material is disclosed. The quality and/or uniformity of the coating is evaluated by a reflectometer. The reflectometer is positioned relative to the object by non-contact sensors. Reflectance data gathered by the reflectometer is analyzed to determine to what extent the actual coating differs from the optimal (i.e., ideal) coating. A feedback system modifies the coating process for subsequent objects in an attempt to fine-tune the coating process and achieve optimal anti-reflective coatings for later objects passing through the system.

    摘要翻译: 公开了一种用于评估涂覆有抗反射涂层材料的物体(例如CRT)的反射率的系统。 通过反射计评价涂层的质量和/或均匀性。 反射计通过非接触传感器相对于物体定位。 分析由反射计收集的反射率数据,以确定实际涂层在何种程度上与最佳(即理想)涂层不同。 反馈系统修改后续物体的涂覆过程,以试图微调涂层工艺,并为后续物体通过系统获得最佳的抗反射涂层。

    System for evaluating thin film coatings
    2.
    发明授权
    System for evaluating thin film coatings 失效
    薄膜涂层评估系统

    公开(公告)号:US6128087A

    公开(公告)日:2000-10-03

    申请号:US74843

    申请日:1998-05-08

    IPC分类号: C23C14/54 C23C14/56 G01B11/06

    摘要: A system for evaluating the reflectance of an object (e.g., a CRT) that is coated with an anti-reflective coating material is disclosed. The quality and/or uniformity of the coating is evaluated by a reflectometer. The reflectometer is positioned relative to the object by non-contact sensors. Reflectance data gathered by the reflectometer is analyzed to determine to what extent the actual coating differs from the optimal (i.e., ideal) coating. A feedback system modifies the coating process for subsequent objects in an attempt to fine-tune the coating process and achieve optimal anti-reflective coatings.

    摘要翻译: 公开了一种用于评估涂覆有抗反射涂层材料的物体(例如CRT)的反射率的系统。 通过反射计评价涂层的质量和/或均匀性。 反射计通过非接触传感器相对于物体定位。 分析由反射计收集的反射率数据,以确定实际涂层在何种程度上与最佳(即理想)涂层不同。 反馈系统改变后续物体的涂覆过程,以试图微调涂层工艺并实现最佳的抗反射涂层。