公开(公告)号：US5666095A

公开(公告)日：1997-09-09

申请号：US622647

申请日：1996-03-26

申请人： Won Namkung ,  Joo-Sik Park ,  Seung-Hwan Kim ,  Hee-Seob Kim ,  Yong-Jung Park

发明人： Won Namkung ,  Joo-Sik Park ,  Seung-Hwan Kim ,  Hee-Seob Kim ,  Yong-Jung Park

IPC分类号： H01P3/00 ,  H01P1/12

CPC分类号： H01P1/122

摘要： A high power waveguide valve capable of selectively transmitting or sealing the high power without causing its breakdown during a high power operation is disclosed. The inventive high power waveguide valve includes a vacuum chamber, a U-shaped waveguide being provided in the vacuum chamber, a first linear motion driver for vertically sliding the U-shaped waveguide, a dual H-corners assembly connected with the U-shaped waveguide, a sealing plate for selectively sealing the radio frequency between the U-shaped waveguide and the dual H-corners assembly, and a second linear motion driver for horizontally sliding the sealing plate.

摘要翻译： 公开了一种能够在高功率操作期间选择性地传输或密封大功率而不引起其击穿的大功率波导阀。 本发明的大功率波导阀包括真空室，设置在真空室中的U形波导，用于垂直滑动U形波导的第一直线运动驱动器，与U形波导连接的双H角组件 ，用于选择性地密封U形波导和双H角组件之间的射频的密封板，以及用于水平滑动密封板的第二线性运动驱动器。

公开(公告)号：US08221674B2

公开(公告)日：2012-07-17

申请号：US12158826

申请日：2006-12-20

申请人： Franz Hauzenberger ,  Karl Zehetbauer ,  Jun Hyuk Lee ,  Myoung Kyun Shin ,  Won Namkung ,  Minyoung Cho ,  Sun-Kwang Jeong ,  Nag Joon Choi ,  Hang Goo Kim

发明人： Franz Hauzenberger ,  Karl Zehetbauer ,  Jun Hyuk Lee ,  Myoung Kyun Shin ,  Won Namkung ,  Minyoung Cho ,  Sun-Kwang Jeong ,  Nag Joon Choi ,  Hang Goo Kim

IPC分类号： B01J8/24

CPC分类号： B01J8/44 ,  B01J2219/00247 ,  C21B13/0033 ,  F27B15/10

摘要： A distributor bottom, particularly a nozzle-type distributor bottom, for steadily introducing process gas, especially process gas loaded with solid particles, into a process chamber, optionally to create a fluidized bed. The process chamber is disposed above the distributor bottom and is formed by walls of a reactor used for metallurgically, particularly thermally, treating feedstock. The distributor bottom is provided with a plurality of holes. Holes are arranged near the walls to prevent substances from attaching to the reactor walls. Special arrangements relate to nozzles and ducts.

摘要翻译： 分配器底部，特别是喷嘴型分配器底部，用于将工艺气体，特别是负载有固体颗粒的处理气体稳定地引入到处理室中，任选地产生流化床。 处理室设置在分配器底部上方，并且由用于冶金，特别是热处理原料的反应器的壁形成。 分配器底部设有多个孔。 在墙壁附近设置孔，以防止物质附着在反应器壁上。 特殊布置涉及喷嘴和管道。

公开(公告)号：US20090039573A1

公开(公告)日：2009-02-12

申请号：US12158826

申请日：2006-12-20

申请人： Franz Hauzenberger ,  Karl Zehetbauer ,  Jun Hyuk Lee ,  Myoung Kyun Shin ,  Won Namkung ,  Minyoung Cho ,  Sun-Kwang Jeong ,  Nag Joon Choi ,  Hang Goo Kim

发明人： Franz Hauzenberger ,  Karl Zehetbauer ,  Jun Hyuk Lee ,  Myoung Kyun Shin ,  Won Namkung ,  Minyoung Cho ,  Sun-Kwang Jeong ,  Nag Joon Choi ,  Hang Goo Kim

IPC分类号： B01J8/24

CPC分类号： B01J8/44 ,  B01J2219/00247 ,  C21B13/0033 ,  F27B15/10

摘要： A distributor bottom, particularly a nozzle-type distributor bottom, for steadily introducing process gas, especially process gas loaded with solid particles, into a process chamber, optionally to create a fluidized bed. The process chamber is disposed above the distributor bottom and is formed by walls of a reactor used for metallurgically, particularly thermally, treating feedstock. The distributor bottom is provided with a plurality of holes. Holes are arranged near the walls to prevent substances from attaching to the reactor walls. Special arrangements relate to nozzles and ducts.

摘要翻译： 分配器底部，特别是喷嘴型分配器底部，用于将工艺气体，特别是负载有固体颗粒的处理气体稳定地引入到处理室中，任选地产生流化床。 处理室设置在分配器底部上方，并且由用于冶金，特别是热处理原料的反应器的壁形成。 分配器底部设有多个孔。 在墙壁附近设置孔，以防止物质附着在反应器壁上。 特殊布置涉及喷嘴和管道。