Semiconductor Device
    1.
    发明申请
    Semiconductor Device 有权
    半导体器件

    公开(公告)号:US20140264740A1

    公开(公告)日:2014-09-18

    申请号:US13833684

    申请日:2013-03-15

    IPC分类号: H01L49/02

    CPC分类号: H01L27/0805 H01L28/60

    摘要: A semiconductor device comprising: a first, a second and a third conductive layer; the second conductive layer being located between the first and third conductive layers; wherein respective regions of the first and second conductive layers form a first capacitor; and respective regions of the second and third conductive layers form a second capacitor.

    摘要翻译: 一种半导体器件,包括:第一,第二和第三导电层; 所述第二导电层位于所述第一和第三导电层之间; 其中所述第一和第二导电层的各个区域形成第一电容器; 并且第二和第三导电层的各个区域形成第二电容器。