CONTINUOUS MAGNETIC MIXING SYSTEM WITH FLEXIBLE GEOMETRIC MIXING ZONE
    1.
    发明申请
    CONTINUOUS MAGNETIC MIXING SYSTEM WITH FLEXIBLE GEOMETRIC MIXING ZONE 审中-公开
    具有柔性几何混合区域的连续磁化混合系统

    公开(公告)号:US20150085599A1

    公开(公告)日:2015-03-26

    申请号:US14037742

    申请日:2013-09-26

    申请人: XEROX CORPORATION

    IPC分类号: B01F13/08

    CPC分类号: B01F13/0818 B01F5/0647

    摘要: A mixing process and system can include a plurality of magnetic particles within a fluid such as a liquid or solid to be mixed. The fluid to be mixed is dispensed within a mixing zone that may include a mixing tube. Two or more opposing electromagnets are independently activated out of sync to affect a travel path of the magnetic particles to form a turbulence within the fluid to provide an effective mixing of the fluid. The magnetic particles may be removed from the fluid, for example by filtering, or may remain within the fluid.

    摘要翻译: 混合过程和系统可以包括在待混合的液体或固体的流体内的多个磁性颗粒。 要混合的流体被分配在可以包括混合管的混合区中。 两个或更多个相对的电磁体独立地被激活而不同步,以影响磁性颗粒的行进路径,以在流体内形成湍流以提供流体的有效混合。 磁性颗粒可以从流体中除去,例如通过过滤,或者可以保留在流体中。

    Innovative and flexible fixture for poling plan

    公开(公告)号:US11968900B2

    公开(公告)日:2024-04-23

    申请号:US17109953

    申请日:2020-12-02

    申请人: Xerox Corporation

    IPC分类号: H10N30/04 H10N30/08 H01T19/00

    CPC分类号: H10N30/04 H10N30/08 H01T19/00

    摘要: An apparatus 10 for poling piezoelectric material includes a platen 22 which holds a sample 20 of piezoelectric material to be poled and a stage 30 to which the platen is mounted. The stage 30 is arranged to selectively move the platen 22 and thereby the sample 20 which the platen 22 holds. The platen 22 is movable by the stage 30 selectively between a first position and a second position. A corona source 40 generates a corona to which the sample 20 is exposed when the platen 22 is moved to the first position by the stage 30. An electrostatic voltmeter 60 having a probe 62 measures a surface potential of the sample 20 when the platen 22 is moved to the second position by the stage 30.

    INNOVATIVE AND FLEXIBLE FIXTURE FOR POLING PLAN

    公开(公告)号:US20220173304A1

    公开(公告)日:2022-06-02

    申请号:US17109953

    申请日:2020-12-02

    申请人: Xerox Corporation

    IPC分类号: H01L41/253 H01L41/33

    摘要: An apparatus 10 for poling piezoelectric material includes a platen 22 which holds a sample 20 of piezoelectric material to be poled and a stage 30 to which the platen is mounted. The stage 30 is arranged to selectively move the platen 22 and thereby the sample 20 which the platen 22 holds. The platen 22 is movable by the stage 30 selectively between a first position and a second position. A corona source 40 generates a corona to which the sample 20 is exposed when the platen 22 is moved to the first position by the stage 30. An electrostatic voltmeter 60 having a probe 62 measures a surface potential of the sample 20 when the platen 22 is moved to the second position by the stage 30.