公开(公告)号：US20120062859A1

公开(公告)日：2012-03-15

申请号：US13225061

申请日：2011-09-02

Applicant: YASUHIRO KITAMURA

Inventor： YASUHIRO KITAMURA

IPC: G03B27/52

CPC classification number: G03F7/70341

Abstract: An exposure apparatus includes a projection optical system and a liquid supply device. The projection optical system includes an image plane side optical member, which is arranged in an optical path of exposure light, and a lens barrel, which supports the image plane side optical member. The liquid supply device polishes the image plane side optical member in a state supported by the lens barrel to change the shape of the image plane side optical member.

Abstract translation: 曝光装置包括投影光学系统和液体供应装置。 投影光学系统包括布置在曝光光的光路中的像平面侧光学构件和支撑像面侧光学构件的透镜镜筒。 液体供应装置以由镜筒支撑的状态抛光图像平面侧光学构件，以改变像面侧光学构件的形状。