PMR WRITER AND METHOD OF FABRICATION
    1.
    发明申请
    PMR WRITER AND METHOD OF FABRICATION 有权
    PMR WRITER和制造方法

    公开(公告)号:US20110134568A1

    公开(公告)日:2011-06-09

    申请号:US12634514

    申请日:2009-12-09

    IPC分类号: G11B5/10

    摘要: Methods for fabrication of tapered magnetic poles with a non-magnetic front bump layer. A magnetic pole may have a tapered surface at or near an air bearing surface (ABS), wherein a thickness of the write pole increases in a direction away from the ABS. A non-magnetic front bump layer may be formed on the tapered surface of the magnetic pole and away from the ABS. The front bump layer may increase the separation distance between a shield layer and the magnetic pole near the tapered surface, thereby improving the performance of the write head.

    摘要翻译: 用非磁性前凸块层制造锥形磁极的方法。 磁极可以在空气轴承表面(ABS)处或附近具有锥形表面,其中写入极的厚度在远离ABS的方向上增加。 可以在磁极的锥形表面上远离ABS形成非磁性前凸块层。 前凸块层可以增加在锥形表面附近的屏蔽层和磁极之间的间隔距离,从而提高写入头的性能。

    PERPENDICULAR WRITE HEAD WITH WRAP AROUND SHIELD AND CONFORMAL SIDE GAP
    2.
    发明申请
    PERPENDICULAR WRITE HEAD WITH WRAP AROUND SHIELD AND CONFORMAL SIDE GAP 有权
    平头写字头与封面和合适的边缝

    公开(公告)号:US20120125885A1

    公开(公告)日:2012-05-24

    申请号:US12954458

    申请日:2010-11-24

    IPC分类号: G11B21/00

    摘要: A perpendicular write head having a wrap around shield and a conformal side gap. In fabricating the write head, the leading edge shield may be chemical mechanical polished down to a level that is substantially even with a chemical mechanical polishing stop layer. Because the leading edge shield and the chemical mechanical polishing stop layer are used as RIE stop for trench RIE, a fully conformal side shield may be formed with a LTE/LES.

    摘要翻译: 垂直写头,其具有围绕屏蔽的保护层和保形侧间隙。 在制造写入头时,前缘屏蔽可以化学机械抛光到基本上均匀的化学机械抛光停止层的水平。 由于前缘屏蔽和化学机械抛光停止层用作沟槽RIE的RIE停止,所以可以用LTE / LES形成完全共形的侧屏蔽。