METHOD AND APPARATUS FOR CONTROLLING A PROCESSING SYSTEM
    1.
    发明申请
    METHOD AND APPARATUS FOR CONTROLLING A PROCESSING SYSTEM 有权
    用于控制加工系统的方法和装置

    公开(公告)号:US20120204965A1

    公开(公告)日:2012-08-16

    申请号:US13359899

    申请日:2012-01-27

    IPC分类号: F17D3/00

    摘要: Methods and apparatus for controlling a processing system are provided herein. In some embodiments, a method of controlling a processing system may include operating a vacuum pump coupled to a process chamber at a first baseline pump idle speed selected to maintain the process chamber at a pressure equal to a first baseline pump idle pressure; monitoring the pressure in the process chamber while operating the vacuum pump at the first baseline pump idle speed; and determining whether the first baseline pump idle pressure can be maintained in the process chamber when the vacuum pump is operating at the first baseline pump idle speed.

    摘要翻译: 本文提供了用于控制处理系统的方法和装置。 在一些实施例中,一种控制处理系统的方法可以包括以选择为将处理室维持在等于第一基准泵空闲压力的压力的第一基准泵空转速度下操作联接到处理室的真空泵; 在第一基准泵怠速下操作真空泵时监测处理室中的压力; 以及当所述真空泵以所述第一基准泵怠速运转时,确定所述处理室中是否能够维持所述第一基准泵怠速压力。