NAIL POLISH GLUE AND PREPARATION METHOD AND APPLICATION THEREOF

    公开(公告)号:US20240225977A9

    公开(公告)日:2024-07-11

    申请号:US18129103

    申请日:2023-03-31

    申请人: Yang Lu Wei Zhang

    发明人: Yang LU Wei ZHANG

    摘要: A nail polish glue and a preparation method and application thereof are provided. The nail polish glue includes the following components in parts by weight: 15-57 parts of an acrylate prepolymer, 20-52 parts of an acrylate active monomer, 5-10 parts of a photoinitiator, 5-10 parts of mercaptan, 5-10 parts of an additive, and 3-8 parts of a colorant. The nail polish glue of the present disclosure has low odor and environmental friendliness, is convenient to operate and package, can be directly applied without using a primer and a seal, and has the adhesion of the primer and the gloss retention of the seal. Through reasonable collocation and mutual complement of the amount of components, excellent mechanical properties including hardness, adhesion and wear resistance, which are significantly improved, are effectively achieved.

    NAIL POLISH GLUE AND PREPARATION METHOD AND APPLICATION THEREOF

    公开(公告)号:US20240130943A1

    公开(公告)日:2024-04-25

    申请号:US18129103

    申请日:2023-03-30

    申请人: Yang Lu Wei Zhang

    发明人: Yang LU Wei ZHANG

    摘要: A nail polish glue and a preparation method and application thereof are provided. The nail polish glue includes the following components in parts by weight: 15-57 parts of an acrylate prepolymer, 20-52 parts of an acrylate active monomer, 5-10 parts of a photoinitiator, 5-10 parts of mercaptan, 5-10 parts of an additive, and 3-8 parts of a colorant. The nail polish glue of the present disclosure has low odor and environmental friendliness, is convenient to operate and package, can be directly applied without using a primer and a seal, and has the adhesion of the primer and the gloss retention of the seal. Through reasonable collocation and mutual complement of the amount of components, excellent mechanical properties including hardness, adhesion and wear resistance, which are significantly improved, are effectively achieved.