公开(公告)号：US20110076119A1

公开(公告)日：2011-03-31

申请号：US12993914

申请日：2009-05-19

申请人： Yasuhiro Tobe ,  Satoru Kawakami ,  Shinji Matsubayashi ,  Yosuke Muraguchi ,  Yasuyoshi Kitazawa ,  Yasumichi Mieno

发明人： Yasuhiro Tobe ,  Satoru Kawakami ,  Shinji Matsubayashi ,  Yosuke Muraguchi ,  Yasuyoshi Kitazawa ,  Yasumichi Mieno

IPC分类号： H01L21/677

CPC分类号： H01L21/68764 ,  B65G49/061 ,  B65G2249/02 ,  B65G2249/045 ,  H01L21/67709

摘要： An object is to provide a vacuum processing apparatus that is capable of suppressing the costs and making control easy. Provided is a vacuum processing apparatus that includes a vacuum section (2) of which inside is held in vacuum, a placing section (3) that is disposed inside the vacuum section (2) and is capable of placing a workpiece thereon, a linear motor 4) that includes coils (415) and makes the placing section (3) travel within the vacuum section, wherein air is placed inside the placing section (3) while being isolated from the vacuum section (2), and the coils (415) of the linear motor (4) are disposed inside the placing section (3).

摘要翻译： 本发明的目的是提供一种能够抑制成本并使控制变得容易的真空处理装置。 本发明提供一种真空处理装置，其特征在于，具备将真空部保持在真空中的真空部（2），配置在所述真空部（2）内部并能够在其上放置工件的放置部（3） 4），其包括线圈（415）并使放置部分（3）在真空部分内行进，其中空气在与真空部分（2）隔离的同时放置在放置部分（3）内，并且线圈（415） 线性电动机（4）配置在放置部（3）的内部。

公开(公告)号：US08522958B2

公开(公告)日：2013-09-03

申请号：US12993914

申请日：2009-05-19

申请人： Yasuhiro Tobe ,  Satoru Kawakami ,  Shinji Matsubayashi ,  Yosuke Muraguchi ,  Yasuyoshi Kitazawa ,  Yasumichi Mieno

发明人： Yasuhiro Tobe ,  Satoru Kawakami ,  Shinji Matsubayashi ,  Yosuke Muraguchi ,  Yasuyoshi Kitazawa ,  Yasumichi Mieno

IPC分类号： B65G49/00 ,  B65G54/02

CPC分类号： H01L21/68764 ,  B65G49/061 ,  B65G2249/02 ,  B65G2249/045 ,  H01L21/67709

摘要： An object is to provide a vacuum processing apparatus that is capable of suppressing the costs and making control easy. Provided is a vacuum processing apparatus that includes a vacuum section (2) of which inside is held in vacuum, a placing section (3) that is disposed inside the vacuum section (2) and is capable of placing a workpiece thereon, a linear motor 4) that includes coils (415) and makes the placing section (3) travel within the vacuum section, wherein air is placed inside the placing section (3) while being isolated from the vacuum section (2), and the coils (415) of the linear motor (4) are disposed inside the placing section (3).

摘要翻译： 本发明的目的是提供一种能够抑制成本并使控制变得容易的真空处理装置。 本发明提供一种真空处理装置，其特征在于，具备将真空部保持在真空中的真空部（2），配置在所述真空部（2）内部并能够在其上放置工件的放置部（3） 4），其包括线圈（415）并使放置部分（3）在真空部分内行进，其中在与真空部分（2）隔离的同时，空气放置在放置部分（3）内，并且线圈（415） 线性电动机（4）配置在放置部（3）的内部。

公开(公告)号：US08177048B2

公开(公告)日：2012-05-15

申请号：US12536735

申请日：2009-08-06

申请人： Yushi Sato ,  Toshio Miki ,  Yosuke Muraguchi ,  Katsumi Yasuda ,  Kazunari Kitaji ,  Yasushi Muragishi ,  Minoru Maeda

发明人： Yushi Sato ,  Toshio Miki ,  Yosuke Muraguchi ,  Katsumi Yasuda ,  Kazunari Kitaji ,  Yasushi Muragishi ,  Minoru Maeda

IPC分类号： H01L21/677

CPC分类号： H02K41/03 ,  H01F38/14 ,  H01L21/677 ,  Y10S414/139 ,  Y10T74/20311 ,  Y10T74/20317

摘要： A vacuum processing apparatus includes a vacuum chamber capable of keeping a first pressure lower than an atmospheric pressure, a driving source disposed in the vacuum chamber, an electric power supply mechanism including a primary side mechanism disposed outside the vacuum chamber for supplying electric power to the driving source and a secondary side mechanism disposed in the vacuum chamber for receiving the electric power from the primary side mechanism in a contactless relationship, and a vessel capable of accommodating airtightly the secondary side mechanism under a second pressure higher than the first pressure.

摘要翻译： 真空处理装置包括能够保持低于大气压的第一压力的真空室，设置在真空室中的驱动源，电力供给机构，包括设置在真空室外部的一次侧机构，用于向该真空室供给电力 驱动源和设置在真空室中的副侧机构，用于以非接触的关系接收来自初级侧机构的电力，以及能够在高于第一压力的第二压力下气密地容纳二次侧机构的容器。

公开(公告)号：US20100036523A1

公开(公告)日：2010-02-11

申请号：US12536735

申请日：2009-08-06

申请人： Yushi SATO ,  Toshio Miki ,  Yosuke Muraguchi ,  Katsumi Yasuda ,  Kazunari Kitaji ,  Yasushi Muragishi ,  Minoru Maeda

发明人： Yushi SATO ,  Toshio Miki ,  Yosuke Muraguchi ,  Katsumi Yasuda ,  Kazunari Kitaji ,  Yasushi Muragishi ,  Minoru Maeda

IPC分类号： H01L21/677

CPC分类号： H02K41/03 ,  H01F38/14 ,  H01L21/677 ,  Y10S414/139 ,  Y10T74/20311 ,  Y10T74/20317

摘要： A vacuum processing apparatus includes a vacuum chamber capable of keeping a first pressure lower than an atmospheric pressure, a driving source disposed in the vacuum chamber, an electric power supply mechanism including a primary side mechanism disposed outside the vacuum chamber for supplying electric power to the driving source and a secondary side mechanism disposed in the vacuum chamber for receiving the electric power from the primary side mechanism in a contactless relationship, and a vessel capable of accommodating airtightly the secondary side mechanism under a second pressure higher than the first pressure.

摘要翻译： 真空处理装置包括能够保持低于大气压的第一压力的真空室，设置在真空室中的驱动源，电力供给机构，包括设置在真空室外部的一次侧机构，用于向该真空室供给电力 驱动源和设置在真空室中的副侧机构，用于以非接触的关系接收来自初级侧机构的电力，以及能够在高于第一压力的第二压力下气密地容纳二次侧机构的容器。