Photoresist composition, coating method thereof, method of forming organic film pattern using the same and display device fabricated thereby
    1.
    发明授权
    Photoresist composition, coating method thereof, method of forming organic film pattern using the same and display device fabricated thereby 有权
    光致抗蚀剂组合物,其涂布方法,使用其形成有机膜图案的方法和由其制造的显示装置

    公开(公告)号:US07887994B2

    公开(公告)日:2011-02-15

    申请号:US12024688

    申请日:2008-02-01

    IPC分类号: C08F2/46 C08J3/28

    摘要: Disclosed herein is a photoresist composition suitable for coating onto a large substrate and having improved coating uniformity to prevent occurrence of stains, a coating method thereof, a method of forming an organic film pattern using the same, and a display device fabricated thereby. The present invention thus provides a photoresist composition comprising a polymeric resin with an incorporated polysiloxane resin, a photosensitive compound, and an organic solvent. Accordingly, the photoresist composition can be coated onto a large substrate by a spinless coating method, and thereby coating uniformity can be improved, the occurrence of stains such as cumulous stains and resin streaks can be prevented, and the coating rate and quality of a final product prepared using the photoresist composition can also thereby be enhanced.

    摘要翻译: 本文公开了适用于涂覆在大基材上并具有改进的涂料均匀性以防止污渍发生的光致抗蚀剂组合物,其涂布方法,使用其形成有机膜图案的方法,以及由其制造的显示装置。 因此,本发明提供一种光致抗蚀剂组合物,其包含聚合树脂与掺入的聚硅氧烷树脂,光敏化合物和有机溶剂。 因此,可以通过无旋涂法将光致抗蚀剂组合物涂布在大的基材上,从而可以提高涂布均匀性,可以防止污渍和树脂条纹等污渍的发生,最终的涂布速度和质量 因此,可以提高使用光致抗蚀剂组合物制备的产品。