公开(公告)号：US06288493B1

公开(公告)日：2001-09-11

申请号：US09562902

申请日：2000-05-02

申请人： Yong-Kwan Lee ,  Nam-Sik Yoon ,  Sung-Sik Kim ,  Pyung-Woo Lee ,  Hong-Young Chang

发明人： Yong-Kwan Lee ,  Nam-Sik Yoon ,  Sung-Sik Kim ,  Pyung-Woo Lee ,  Hong-Young Chang

IPC分类号： H05H124

CPC分类号： H01J37/321 ,  H05H1/46

摘要： The invention relates to an antenna device of a low impedance for generating a large quantity of inductively coupled plasma to process a large size of a specimen with adjustment for a uniform distribution in the density of plasma, comprising: a high frequency power source; a first antenna for receiving the high frequency power supplied from the high frequency power source; and a second antenna connected in parallel with the first antenna for receiving the high frequency power supplied from the high frequency power source, wherein a resonant state is kept between the first and second antennas.

摘要翻译： 本发明涉及一种用于产生大量电感耦合等离子体的低阻抗天线装置，用于对等离子体密度进行调整以调整大尺寸样品，包括：高频电源; 用于接收从高频电源提供的高频电力的第一天线; 以及与第一天线并联连接的第二天线，用于接收从高频电源提供的高频电力，其中谐振状态保持在第一和第二天线之间。